Fabrication of ordered arrays of silicon nanopillars in silicon-on-insulator wafers

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Fabrication of ordered arrays of silicon nanopillars in silicon-on-insulator wafers. / Wellner, Anja; Preece, Paul; Fowler, JC; Palmer, Richard.

In: Microelectronic Engineering, Vol. 57-58, 01.01.2001, p. 919-924.

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@article{7e96278c42894d5dbd2be6504b2ff20b,
title = "Fabrication of ordered arrays of silicon nanopillars in silicon-on-insulator wafers",
abstract = "Hexagonal arrays of silicon nanopillars have been fabricated in a silicon-on-insulator wafer using a patterned metal layer as a mask for reactive ion etching. The metal mask is created by deposition through a self-assembled monolayer of polymer particles. In the case of a silver mask, we find that the quality of the pillars depends on the wetting of the exposed silicon regions in the interstitial sites between the polymer balls, which in turn depends on the deposition parameters, such as pressure and deposition rate. Gold is found to wet the silicon, producing smooth masks which lead to pyramidal silicon structures after etching.",
author = "Anja Wellner and Paul Preece and JC Fowler and Richard Palmer",
year = "2001",
month = jan,
day = "1",
doi = "10.1016/S0167-9317(01)00457-9",
language = "English",
volume = "57-58",
pages = "919--924",
journal = "Microelectron Engineering",
issn = "0167-9317",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Fabrication of ordered arrays of silicon nanopillars in silicon-on-insulator wafers

AU - Wellner, Anja

AU - Preece, Paul

AU - Fowler, JC

AU - Palmer, Richard

PY - 2001/1/1

Y1 - 2001/1/1

N2 - Hexagonal arrays of silicon nanopillars have been fabricated in a silicon-on-insulator wafer using a patterned metal layer as a mask for reactive ion etching. The metal mask is created by deposition through a self-assembled monolayer of polymer particles. In the case of a silver mask, we find that the quality of the pillars depends on the wetting of the exposed silicon regions in the interstitial sites between the polymer balls, which in turn depends on the deposition parameters, such as pressure and deposition rate. Gold is found to wet the silicon, producing smooth masks which lead to pyramidal silicon structures after etching.

AB - Hexagonal arrays of silicon nanopillars have been fabricated in a silicon-on-insulator wafer using a patterned metal layer as a mask for reactive ion etching. The metal mask is created by deposition through a self-assembled monolayer of polymer particles. In the case of a silver mask, we find that the quality of the pillars depends on the wetting of the exposed silicon regions in the interstitial sites between the polymer balls, which in turn depends on the deposition parameters, such as pressure and deposition rate. Gold is found to wet the silicon, producing smooth masks which lead to pyramidal silicon structures after etching.

U2 - 10.1016/S0167-9317(01)00457-9

DO - 10.1016/S0167-9317(01)00457-9

M3 - Article

VL - 57-58

SP - 919

EP - 924

JO - Microelectron Engineering

JF - Microelectron Engineering

SN - 0167-9317

ER -