Fabrication of ordered arrays of silicon nanopillars in silicon-on-insulator wafers

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Hexagonal arrays of silicon nanopillars have been fabricated in a silicon-on-insulator wafer using a patterned metal layer as a mask for reactive ion etching. The metal mask is created by deposition through a self-assembled monolayer of polymer particles. In the case of a silver mask, we find that the quality of the pillars depends on the wetting of the exposed silicon regions in the interstitial sites between the polymer balls, which in turn depends on the deposition parameters, such as pressure and deposition rate. Gold is found to wet the silicon, producing smooth masks which lead to pyramidal silicon structures after etching.


Original languageEnglish
Pages (from-to)919-924
Number of pages6
JournalMicroelectronic Engineering
Publication statusPublished - 1 Jan 2001