Fabrication of nanoscale vertical colloid device architectures

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Fabrication of nanoscale vertical colloid device architectures. / Parker, Andrew; Childs, Peter; Palmer, Richard.

In: Microelectronic Engineering, Vol. 73-74, 01.06.2004, p. 542-546.

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@article{a9ab2ec0cb254b5182e8a694d304619b,
title = "Fabrication of nanoscale vertical colloid device architectures",
abstract = "The design, fabrication and preliminary testing of a vertical nanodevice comprising an active region of gold colloidal nanoparticles deposited within a silicon nanopillar architecture is presented. Each step of the fabrication is a parallel process, starting with the production of an array of silicon pillars using natural lithographic techniques. Electrical measurements through a small array of these pillars show linear behaviour in the current-voltage curves, which lead to a pillar resistance value fully commensurate with the known geometry. The results in this paper show the fabrication at each stage, and when combined with characterisation data represent a demonstration of the 'proof of principle' of our approach. (C) 2004 Published by Elsevier B.V.",
keywords = "silicon nanopillar, natural lithography, vertical nanodevice, gold colloidal nanoparticles",
author = "Andrew Parker and Peter Childs and Richard Palmer",
year = "2004",
month = jun,
day = "1",
doi = "10.1016/S0167-9317(04)00135-2",
language = "English",
volume = "73-74",
pages = "542--546",
journal = "Microelectron Engineering",
issn = "0167-9317",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - Fabrication of nanoscale vertical colloid device architectures

AU - Parker, Andrew

AU - Childs, Peter

AU - Palmer, Richard

PY - 2004/6/1

Y1 - 2004/6/1

N2 - The design, fabrication and preliminary testing of a vertical nanodevice comprising an active region of gold colloidal nanoparticles deposited within a silicon nanopillar architecture is presented. Each step of the fabrication is a parallel process, starting with the production of an array of silicon pillars using natural lithographic techniques. Electrical measurements through a small array of these pillars show linear behaviour in the current-voltage curves, which lead to a pillar resistance value fully commensurate with the known geometry. The results in this paper show the fabrication at each stage, and when combined with characterisation data represent a demonstration of the 'proof of principle' of our approach. (C) 2004 Published by Elsevier B.V.

AB - The design, fabrication and preliminary testing of a vertical nanodevice comprising an active region of gold colloidal nanoparticles deposited within a silicon nanopillar architecture is presented. Each step of the fabrication is a parallel process, starting with the production of an array of silicon pillars using natural lithographic techniques. Electrical measurements through a small array of these pillars show linear behaviour in the current-voltage curves, which lead to a pillar resistance value fully commensurate with the known geometry. The results in this paper show the fabrication at each stage, and when combined with characterisation data represent a demonstration of the 'proof of principle' of our approach. (C) 2004 Published by Elsevier B.V.

KW - silicon nanopillar

KW - natural lithography

KW - vertical nanodevice

KW - gold colloidal nanoparticles

UR - http://www.scopus.com/inward/record.url?scp=2542421318&partnerID=8YFLogxK

U2 - 10.1016/S0167-9317(04)00135-2

DO - 10.1016/S0167-9317(04)00135-2

M3 - Article

VL - 73-74

SP - 542

EP - 546

JO - Microelectron Engineering

JF - Microelectron Engineering

SN - 0167-9317

ER -