Development and validation of functional imprint material for the step and flash imprint lithography process

J Kettle, P Coppo, G Lalev, C Tattershall, Stefan Dimov, ML Turner

Research output: Contribution to journal › Article

16 Citations (Scopus)

Original language	English
Pages (from-to)	850
Number of pages	1
Journal	Microelectronic Engineering
Volume	85
Issue number	5-6
Publication status	Published - 1 Jan 2008

Cite this

@article{8506d7a33f2740148aefcc8b8f200de5,

title = "Development and validation of functional imprint material for the step and flash imprint lithography process",

author = "J Kettle and P Coppo and G Lalev and C Tattershall and Stefan Dimov and ML Turner",

year = "2008",

month = jan,

day = "1",

language = "English",

volume = "85",

pages = "850",

journal = "Microelectronic Engineering",

issn = "1873-5568",

publisher = "Elsevier",

number = "5-6",

}

TY - JOUR

T1 - Development and validation of functional imprint material for the step and flash imprint lithography process

AU - Kettle, J

AU - Coppo, P

AU - Lalev, G

AU - Tattershall, C

AU - Dimov, Stefan

AU - Turner, ML

PY - 2008/1/1

Y1 - 2008/1/1

M3 - Article

SN - 1873-5568

VL - 85

SP - 850

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-6

ER -