Development and validation of functional imprint material for the step and flash imprint lithography process

Research output: Contribution to journalArticle

Authors

  • J Kettle
  • P Coppo
  • G Lalev
  • C Tattershall
  • ML Turner

Colleges, School and Institutes

Details

Original languageEnglish
Pages (from-to)850
Number of pages1
JournalMicroelectronic Engineering
Volume85
Issue number5-6
Publication statusPublished - 1 Jan 2008