Chemically amplified molecular resists for electron beam lithography

Research output: Contribution to conference (unpublished)Paper

Authors

Details

Original languageEnglish
Pages1115-1118
Number of pages4
Publication statusPublished - 1 Apr 2006
Event31st International Conference on Micro- and Nano-Engineering, Sep 19-22, 2005. Vienna, Austria -
Duration: 1 Apr 2006 → …

Conference

Conference31st International Conference on Micro- and Nano-Engineering, Sep 19-22, 2005. Vienna, Austria
Period1/04/06 → …

Keywords

  • fullerene, molecular resist, electron beam lithography, triphenylene