Chemically amplified molecular resists for electron beam lithography

Alexander Robinson, HM Zaid, FP Gibbons, Richard Palmer, Mayandithevar Manickam, Jon Preece, R Brainard, T Zampini, K O'Connell

Research output: Contribution to conference (unpublished)Paper

32 Citations (Scopus)
Original languageEnglish
Pages1115-1118
Number of pages4
DOIs
Publication statusPublished - 1 Apr 2006
Event31st International Conference on Micro- and Nano-Engineering, Sep 19-22, 2005. Vienna, Austria -
Duration: 1 Apr 2006 → …

Conference

Conference31st International Conference on Micro- and Nano-Engineering, Sep 19-22, 2005. Vienna, Austria
Period1/04/06 → …

Keywords

  • fullerene
  • molecular resist
  • electron beam lithography
  • triphenylene

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