Chemically amplified molecular resists for E-beam lithography

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Standard

Chemically amplified molecular resists for E-beam lithography. / Manyam, J.; Gibbons, F.P.; Diegoli, S.; Manickam, M.; Preece, J.A.; Palmer, R.E.; Robinson, A.P.G.

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Harvard

Manyam, J, Gibbons, FP, Diegoli, S, Manickam, M, Preece, JA, Palmer, RE & Robinson, APG 2007, Chemically amplified molecular resists for E-beam lithography. in Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. https://doi.org/10.1109/IMNC.2007.4456338

APA

Manyam, J., Gibbons, F. P., Diegoli, S., Manickam, M., Preece, J. A., Palmer, R. E., & Robinson, A. P. G. (2007). Chemically amplified molecular resists for E-beam lithography. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC https://doi.org/10.1109/IMNC.2007.4456338

Vancouver

Manyam J, Gibbons FP, Diegoli S, Manickam M, Preece JA, Palmer RE et al. Chemically amplified molecular resists for E-beam lithography. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007 https://doi.org/10.1109/IMNC.2007.4456338

Author

Manyam, J. ; Gibbons, F.P. ; Diegoli, S. ; Manickam, M. ; Preece, J.A. ; Palmer, R.E. ; Robinson, A.P.G. / Chemically amplified molecular resists for E-beam lithography. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007.

Bibtex

@inproceedings{fa80c2b6ec754dd691f1634845922ce5,
title = "Chemically amplified molecular resists for E-beam lithography",
author = "J. Manyam and F.P. Gibbons and S. Diegoli and M. Manickam and J.A. Preece and R.E. Palmer and A.P.G. Robinson",
year = "2007",
doi = "10.1109/IMNC.2007.4456338",
language = "Undefined/Unknown",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC",

}

RIS

TY - GEN

T1 - Chemically amplified molecular resists for E-beam lithography

AU - Manyam, J.

AU - Gibbons, F.P.

AU - Diegoli, S.

AU - Manickam, M.

AU - Preece, J.A.

AU - Palmer, R.E.

AU - Robinson, A.P.G.

PY - 2007

Y1 - 2007

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-47349090605&partnerID=MN8TOARS

U2 - 10.1109/IMNC.2007.4456338

DO - 10.1109/IMNC.2007.4456338

M3 - Conference contribution

BT - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

ER -