Original language | English |
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Title of host publication | Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC |
DOIs | |
Publication status | Published - 2007 |
Chemically amplified molecular resists for E-beam lithography
J. Manyam, F.P. Gibbons, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution