Chemically amplified fullerene resists for e-beam lithography

Jedsada Manyam, FP Gibbons, Sara Diegoli, Mayandithevar Manickam, Jon Preece, Richard Palmer, Alexander Robinson

Research output: Contribution to conference (unpublished)Paper

Original languageEnglish
Publication statusPublished - 1 Jan 2008
EventAdvances in Resist Materials and Processing Technology, XXV - San Jose, United States
Duration: 24 Feb 2008 → …

Conference

ConferenceAdvances in Resist Materials and Processing Technology, XXV
Country/TerritoryUnited States
CitySan Jose
Period24/02/08 → …

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