Chemically amplified fullerene resists for e-beam lithography

Research output: Contribution to conference (unpublished)Paper

Details

Original languageEnglish
Publication statusPublished - 1 Jan 2008
EventAdvances in Resist Materials and Processing Technology, XXV - San Jose, United States
Duration: 24 Feb 2008 → …

Conference

ConferenceAdvances in Resist Materials and Processing Technology, XXV
CountryUnited States
CitySan Jose
Period24/02/08 → …