10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist

Research output: Contribution to journalArticlepeer-review

Authors

  • T. Tada
  • T. Kanayama
  • M.T. Allen
  • K.D.M. Harris

Details

Original languageUndefined/Unknown
JournalJournal of Physics D: Applied Physics
Publication statusPublished - 1999