Fullerene Chemical Amplified Resists for Next General Lithography (EPSRC Funded via Loughborough University Grant Ref SP/08/01/09 IeMRC)

Project Details

Short titleFullerene Chemical Amplified Resists for Next General Lithography (EPSRC Funded via Loughborough University Grant Ref SP/08/01/09 IeMRC)
StatusFinished
Effective start/end date1/03/08 → 29/01/10

Funding

  • Engineering & Physical Science Research Council