Alex Robinson

Publications

  1. Published

    Suppression of pinhole defects in fullerene molecular electron beam resists

    Alex Robinson, Mayandithevar Manickam & Jon Preece, 1 May 2007, In: Microelectronic Engineering. 84, 5-8, p. 1066-1070 5 p.

    Research output: Contribution to journalArticle

  2. Published

    A high resolution water soluble fullerene molecular resist for electron beam lithography

    Richard Palmer & Alex Robinson, 9 Jul 2008, In: Nanotechnology. 19, 27, p. 275308-

    Research output: Contribution to journalArticle

  3. Published
  4. Published

    Cisplatin adducts of DNA as precursors for nanostructured catalyst materials

    Ruba Hendi, , Neil Rees, Alex Robinson & Jim Tucker, 24 Aug 2020, In: Nanoscale Advances. 2, 10, p. 4491-4497 7 p.

    Research output: Contribution to journalArticlepeer-review

  5. Published
  6. Published
  7. Published
  8. Published
  9. Published

    A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist

    Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 3 Dec 2007, In: Small. 3, 12, p. 2076 1 p.

    Research output: Contribution to journalArticle

  10. Published
  11. Published
  12. Published
  13. Published

    Direct Electron-Beam Writing of Highly Conductive Wires in Functionalized Fullerene Films

    Mayandithevar Manickam, Jon Preece, & Alex Robinson, 4 Dec 2009, In: Small. 5, 23, p. 2750-2755 6 p.

    Research output: Contribution to journalArticle

  14. Published

    The Nucleus

    Alex Robinson, 1 Jan 2009, In: Electron Beam Irradiation of C60(OH)10. 47, p. 267 1 p.

    Research output: Contribution to journalArticle

  15. Published

    Multi-trigger resist for electron beam lithography

    Wolfgang Theis, Alex Robinson, , , , , , (ed.) & (ed.), 28 Sep 2017, Proceedings of the SPIE. Society of Photo-Optical Instrumentation Engineers, Vol. 10446. 1044608. (SPIE - International Society for Optical Engineering. Proceedings; vol. 10446).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  16. Published

    Overview of Materials and Processes for Lithgography

    Alex Robinson, 18 Nov 2016, Materials and Processes for Next Generation Lithography. 1 ed. United Kingdom, Vol. 11. p. 1-90 (Frontiers of Nanoscience; vol. 11).

    Research output: Chapter in Book/Report/Conference proceedingChapter

  17. Published
  18. Published

    Chemically amplified molecular resists for E-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2007, Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  19. Published

    Low activation energy fullerene molecular resist

    Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2009, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  20. Published
  21. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2008, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  22. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2008.

    Research output: Contribution to conference (unpublished)Paper

  23. Published

    Low Activation Energy Fullerene Molecular Resist

    Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2009.

    Research output: Contribution to conference (unpublished)Paper

  24. Published

    Plasma etching of high-resolution features in a fullerene molecular resist

    Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2011, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  25. Published
  26. Published
  27. Published

    Positive tone chemically amplified fullerene resist

    Andreas Frommhold, , , Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2012, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  28. Published
  29. Published
  30. Published

    Improving depth estimation from a plenoptic camera by patterned illumination

    Ela Claridge, Alex Robinson, Kai Bongs, & Iain Styles, 2015, Proceedings of the SPIE. Remondino, F. & Shortis, M. (eds.). Society of Photo-Optical Instrumentation Engineers, Vol. 9528. p. 952815-952815-6 (Proceedings of SPIE; vol. 9528).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  31. Published

    Towards Plenoptic Multi-View Imaging

    Ela Claridge, Alex Robinson, Kai Bongs, & Iain Styles, 2015, Imaging and Applied Optics 2015. Optical Society of America, JT5A.42

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  32. Published
  33. Published
  34. Published
  35. Published

    Organic hard masks utilizing fullerene derivatives

    Richard Palmer, Andreas Frommhold, Alex Robinson, & , 20 Mar 2015, Organic hard masks utilizing fullerene derivatives.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  36. Published

    METHOD OF FORMING AN ELECTRICAL CIRCUIT USING FULLERENE DERIVATIVES

    Richard Palmer, , Jon Preece & Alex Robinson, 17 Feb 2011, Patent No. WO/2011/018601

    Research output: Patent

  37. Published

    Performance of a high resolution chemically amplified electron beam resist at various beam energies

    Richard Palmer, , Andreas Frommhold, , , , , & Alex Robinson, 2 Apr 2016, In: Microelectronic Engineering. 155, p. 97-101

    Research output: Contribution to journalArticlepeer-review

  38. Published

    Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography

    Richard Palmer, Andreas Frommhold, Alex Robinson, , , , & , 20 Mar 2015, Advances in Patterning Materials and Processes XXXI.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  39. Published
  40. Published

    High-resolution EUV lithography using a multi-trigger resist

    Wolfgang Theis, & Alex Robinson, 19 Mar 2018, Extreme Ultraviolet (EUV) Lithography IX. A. Goldberg, K. (ed.). Society of Photo-Optical Instrumentation Engineers, 105831L. (Proceedings of SPIE; vol. 10583).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  41. Published

    Electron beam induced fragmentation of fullerene derivatives

    Alex Robinson, , , , Jon Preece, Douglas Philp, & , 1998, In: Chemical Physics Letters.

    Research output: Contribution to journalArticlepeer-review

  42. Published

    Systematic studies of fullerene derivative electron beam resists

    Alex Robinson, Richard Palmer, , , , Douglas Philp & Jon Preece, 1 Jan 2000, p. 115-120. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  43. Published

    A Fullerene derivative as an electron beam resist for nanolithography

    Alex Robinson, Rebecca Palmer, , & Jon Preece, 1998, In: Applied Physics Letters.

    Research output: Contribution to journalArticlepeer-review

  44. Published
  45. Published
  46. Published

    New high resolution liquid crystal electron beam resists

    Alex Robinson, , , , , Jon Preece & Ken Harris, 1 Jan 2000, p. 129-134. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  47. Published

    Chemically amplified molecular resists for electron beam lithography

    Alex Robinson, , , Richard Palmer, Mayandithevar Manickam, Jon Preece, , & , 1 Apr 2006, p. 1115-1118. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  48. Published
  49. Published

    Spin on Hard-mask material

    Alex Robinson, Andreas Frommhold & , 15 Aug 2013, Patent No. WO/2013/117908

    Research output: Patent

  50. Published

    Exposure mechanism of fullerene derivative electron beam resists

    Alex Robinson, , , , , Douglas Philp & Jon Preece, 1999, In: Chemical Physics Letters.

    Research output: Contribution to journalArticlepeer-review

  51. Published
  52. Published

    Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

    Alex Robinson, Richard Palmer, , , & Jon Preece, 1 Jan 1999, p. 219-224. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  53. E-pub ahead of print

    Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning

    Phil Prewett, , , Alex Robinson & , 26 Feb 2016, (E-pub ahead of print) In: Microelectronic Engineering. 155, p. 74-78

    Research output: Contribution to journalArticlepeer-review

  54. Published

    Scanning probe energy loss spectroscopy with microfabricated coaxial tips

    James Lawton, Alex Robinson & Richard Palmer, 1 Apr 2010, In: Physical Review B. 81, 16, p. 161411 1 p.

    Research output: Contribution to journalArticle

  55. Published

    Fabrication of co-axial field emitter tips for scanning probe energy loss spectroscopy

    Alex Robinson & Richard Palmer, 1 Apr 2010, In: Nanotechnology. 21, 15, p. 155304 1 p.

    Research output: Contribution to journalArticle

  56. Published

    A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

    Alex Robinson, Richard Palmer, , Jon Preece & Ken Harris, 1 Jun 2000, p. 425-428. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  57. Published
  58. Published

    Chemically amplified phenolic fullerene electron beam resist

    Richard Palmer & Alex Robinson, 28 Feb 2014, In: Journal of Materials Chemistry C. 2, 8, p. 1505-1512

    Research output: Contribution to journalArticlepeer-review

  59. Published
  60. Published