Alex Robinson

Publications

  1. Paper › Research › Not peer-reviewed
  2. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2008.

    Research output: Contribution to conference (unpublished)Paper

  3. Published

    Chemically amplified molecular resists for electron beam lithography

    Alex Robinson, , , Richard Palmer, Mayandithevar Manickam, Jon Preece, , & , 1 Apr 2006, p. 1115-1118. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  4. Published

    Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

    Alex Robinson, Richard Palmer, , , & Jon Preece, 1 Jan 1999, p. 219-224. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  5. Published

    Low Activation Energy Fullerene Molecular Resist

    Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2009.

    Research output: Contribution to conference (unpublished)Paper

  6. Published

    New high resolution liquid crystal electron beam resists

    Alex Robinson, , , , , Jon Preece & Ken Harris, 1 Jan 2000, p. 129-134. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  7. Published
  8. Published

    Systematic studies of fullerene derivative electron beam resists

    Alex Robinson, Richard Palmer, , , , Douglas Philp & Jon Preece, 1 Jan 2000, p. 115-120. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  9. Conference contribution › Research
  10. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2008, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  11. Published

    Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching

    Andreas Frommhold, , , Mayandithevar Manickam, Edward Tarte, Jon Preece, Richard Palmer, Alex Robinson & Edward Tarte, 2012, Proceedings of the IEEE Conference on Nanotechnology. 6322209

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  12. Published

    Chemically amplified molecular resists for E-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2007, Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution