Alex Robinson

Publications

  1. Conference contribution › Research
  2. Published

    Organic hard masks utilizing fullerene derivatives

    Richard Palmer, Andreas Frommhold, Alex Robinson, & , 20 Mar 2015, Organic hard masks utilizing fullerene derivatives.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  3. Published

    Plasma etching of high-resolution features in a fullerene molecular resist

    Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2011, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  4. Published

    Positive tone chemically amplified fullerene resist

    Andreas Frommhold, , , Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2012, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  5. Published

    Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography

    Richard Palmer, Andreas Frommhold, Alex Robinson, , , , & , 20 Mar 2015, Advances in Patterning Materials and Processes XXXI.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  6. Published

    Towards Plenoptic Multi-View Imaging

    Ela Claridge, Alex Robinson, Kai Bongs, & Iain Styles, 2015, Imaging and Applied Optics 2015. Optical Society of America, JT5A.42

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  7. Paper › Research › Not peer-reviewed
  8. Published

    A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

    Alex Robinson, Richard Palmer, , Jon Preece & Ken Harris, 1 Jun 2000, p. 425-428. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  9. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2008.

    Research output: Contribution to conference (unpublished)Paper

  10. Published

    Chemically amplified molecular resists for electron beam lithography

    Alex Robinson, , , Richard Palmer, Mayandithevar Manickam, Jon Preece, , & , 1 Apr 2006, p. 1115-1118. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  11. Published

    Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

    Alex Robinson, Richard Palmer, , , & Jon Preece, 1 Jan 1999, p. 219-224. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  12. Published

    Low Activation Energy Fullerene Molecular Resist

    Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2009.

    Research output: Contribution to conference (unpublished)Paper