Alex Robinson

Publications

  1. Abstract › Research › Not peer-reviewed
  2. Published
  3. Chapter › Research
  4. Published

    Overview of Materials and Processes for Lithgography

    Alex Robinson, 18 Nov 2016, Materials and Processes for Next Generation Lithography. 1 ed. United Kingdom, Vol. 11. p. 1-90 (Frontiers of Nanoscience; vol. 11).

    Research output: Chapter in Book/Report/Conference proceedingChapter

  5. Conference contribution › Research
  6. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2008, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  7. Published

    Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching

    Andreas Frommhold, , , Mayandithevar Manickam, Edward Tarte, Jon Preece, Richard Palmer, Alex Robinson & Edward Tarte, 2012, Proceedings of the IEEE Conference on Nanotechnology. 6322209

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  8. Published

    Chemically amplified molecular resists for E-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2007, Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  9. Published

    High-resolution EUV lithography using a multi-trigger resist

    Wolfgang Theis, & Alex Robinson, 19 Mar 2018, Extreme Ultraviolet (EUV) Lithography IX. A. Goldberg, K. (ed.). Society of Photo-Optical Instrumentation Engineers, 105831L. (Proceedings of SPIE; vol. 10583).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  10. Published

    Improving depth estimation from a plenoptic camera by patterned illumination

    Ela Claridge, Alex Robinson, Kai Bongs, & Iain Styles, 2015, Proceedings of the SPIE. Remondino, F. & Shortis, M. (eds.). Society of Photo-Optical Instrumentation Engineers, Vol. 9528. p. 952815-952815-6 (Proceedings of SPIE; vol. 9528).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  11. Published

    Low activation energy fullerene molecular resist

    Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2009, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  12. Published

    Multi-trigger resist for electron beam lithography

    Wolfgang Theis, Alex Robinson, , , , , , (ed.) & (ed.), 28 Sep 2017, Proceedings of the SPIE. Society of Photo-Optical Instrumentation Engineers, Vol. 10446. 1044608. (SPIE - International Society for Optical Engineering. Proceedings; vol. 10446).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  13. Published

    Optimisation of patterned illumination to improve depth estimation from a plenoptic camera

    Ela Claridge, Nadine Meyer, Kai Bongs, Alex Robinson & Iain Styles, 7 Jun 2015, Proceedings of Adaptive Optics: Analysis, Methods and Systems, AO 2015. Optical Society of America, p. JT5A.41 JT5A-41

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  14. Published

    Organic hard masks utilizing fullerene derivatives

    Richard Palmer, Andreas Frommhold, Alex Robinson, & , 20 Mar 2015, Organic hard masks utilizing fullerene derivatives.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  15. Published

    Plasma etching of high-resolution features in a fullerene molecular resist

    Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2011, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  16. Published

    Positive tone chemically amplified fullerene resist

    Andreas Frommhold, , , Mayandithevar Manickam, Jon Preece, Rebecca Palmer & Alex Robinson, 2012, Proceedings of SPIE - The International Society for Optical Engineering.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  17. Published

    Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography

    Richard Palmer, Andreas Frommhold, Alex Robinson, , , , & , 20 Mar 2015, Advances in Patterning Materials and Processes XXXI.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  18. Published

    Towards Plenoptic Multi-View Imaging

    Ela Claridge, Alex Robinson, Kai Bongs, & Iain Styles, 2015, Imaging and Applied Optics 2015. Optical Society of America, JT5A.42

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  19. Paper › Research › Not peer-reviewed
  20. Published

    A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

    Alex Robinson, Richard Palmer, , Jon Preece & Ken Harris, 1 Jun 2000, p. 425-428. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  21. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2008.

    Research output: Contribution to conference (unpublished)Paper

  22. Published

    Chemically amplified molecular resists for electron beam lithography

    Alex Robinson, , , Richard Palmer, Mayandithevar Manickam, Jon Preece, , & , 1 Apr 2006, p. 1115-1118. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  23. Published

    Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

    Alex Robinson, Richard Palmer, , , & Jon Preece, 1 Jan 1999, p. 219-224. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  24. Published

    Low Activation Energy Fullerene Molecular Resist

    Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2009.

    Research output: Contribution to conference (unpublished)Paper

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