Alex Robinson

Publications

  1. Abstract › Research › Not peer-reviewed
  2. Published
  3. Chapter › Research
  4. Published

    Overview of Materials and Processes for Lithgography

    Alex Robinson, 18 Nov 2016, Materials and Processes for Next Generation Lithography. 1 ed. United Kingdom, Vol. 11. p. 1-90 (Frontiers of Nanoscience; vol. 11).

    Research output: Chapter in Book/Report/Conference proceedingChapter

  5. Conference contribution › Research
  6. Published

    High-resolution EUV lithography using a multi-trigger resist

    Wolfgang Theis & Alex Robinson, 19 Mar 2018, Extreme Ultraviolet (EUV) Lithography IX. A. Goldberg, K. (ed.). Society of Photo-Optical Instrumentation Engineers, 105831L. (Proceedings of SPIE; vol. 10583).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  7. Published

    Improving depth estimation from a plenoptic camera by patterned illumination

    Ela Claridge, Alex Robinson, Kai Bongs & Iain Styles, 2015, Proceedings of the SPIE. Remondino, F. & Shortis, M. (eds.). Society of Photo-Optical Instrumentation Engineers, Vol. 9528. p. 952815-952815-6 (Proceedings of SPIE; vol. 9528).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  8. Published

    Multi-trigger resist for electron beam lithography

    Wolfgang Theis, Alex Robinson, (ed.) & (ed.), 28 Sep 2017, Proceedings of the SPIE. Society of Photo-Optical Instrumentation Engineers, Vol. 10446. 1044608. (SPIE - International Society for Optical Engineering. Proceedings; vol. 10446).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  9. Published

    Organic hard masks utilizing fullerene derivatives

    Richard Palmer, Andreas Frommhold, Alex Robinson, 20 Mar 2015, Organic hard masks utilizing fullerene derivatives.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  10. Published

    Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography

    Richard Palmer, Andreas Frommhold, Alex Robinson, 20 Mar 2015, Advances in Patterning Materials and Processes XXXI.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  11. Published

    Towards Plenoptic Multi-View Imaging

    Ela Claridge, Alex Robinson, Kai Bongs & Iain Styles, 2015, Imaging and Applied Optics 2015. Optical Society of America, JT5A.42

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  12. Paper › Research › Not peer-reviewed
  13. Published

    A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

    Alex Robinson, Richard Palmer, Jon Preece & Ken Harris, 1 Jun 2000, p. 425-428. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  14. Published

    Chemically amplified fullerene resists for e-beam lithography

    Sara Diegoli, Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2008.

    Research output: Contribution to conference (unpublished)Paper

  15. Published

    Chemically amplified molecular resists for electron beam lithography

    Alex Robinson, Richard Palmer, Mayandithevar Manickam, Jon Preece, 1 Apr 2006, p. 1115-1118. 4 p.

    Research output: Contribution to conference (unpublished)Paper

  16. Published

    Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

    Alex Robinson, Richard Palmer & Jon Preece, 1 Jan 1999, p. 219-224. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  17. Published

    Low Activation Energy Fullerene Molecular Resist

    Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 1 Jan 2009.

    Research output: Contribution to conference (unpublished)Paper

  18. Published

    New high resolution liquid crystal electron beam resists

    Alex Robinson, Jon Preece & Ken Harris, 1 Jan 2000, p. 129-134. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  19. Published
  20. Published

    Systematic studies of fullerene derivative electron beam resists

    Alex Robinson, Richard Palmer, Douglas Philp & Jon Preece, 1 Jan 2000, p. 115-120. 6 p.

    Research output: Contribution to conference (unpublished)Paper

  21. Article › Research › Not peer-reviewed
  22. Published

    A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist

    Mayandithevar Manickam, Jon Preece, Richard Palmer & Alex Robinson, 3 Dec 2007, In : Small. 3, 12, p. 2076 1 p.

    Research output: Contribution to journalArticle

  23. Published

    A high resolution water soluble fullerene molecular resist for electron beam lithography

    Richard Palmer & Alex Robinson, 9 Jul 2008, In : Nanotechnology. 19, 27, p. 275308-

    Research output: Contribution to journalArticle

  24. Published
  25. Published
Previous 1 2 3 Next