Alex Robinson

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Publications

  1. 2018
  2. Published

    High-resolution EUV lithography using a multi-trigger resist

    Wolfgang Theis & Alex Robinson, 19 Mar 2018, Extreme Ultraviolet (EUV) Lithography IX. A. Goldberg, K. (ed.). Society of Photo-Optical Instrumentation Engineers, 105831L. (Proceedings of SPIE; vol. 10583).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

  3. 2017
  4. Published

    Multi-trigger resist for electron beam lithography

    Wolfgang Theis, Alex Robinson, (ed.) & (ed.), 28 Sep 2017, Proceedings of the SPIE. Society of Photo-Optical Instrumentation Engineers, Vol. 10446. 1044608. (SPIE - International Society for Optical Engineering. Proceedings; vol. 10446).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

  5. Published

    Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness

    Alex Robinson, 18 May 2017, In : Proceedings of SPIE - The International Society for Optical Engineering. 10143, 13 p., 1014328.

    Research output: Contribution to journal › Article

  6. Published

    Lamellar orientation of block copolymer using polarity switch of Nitrophenyl self-assembled monolayer (SAM) induced by electron beam.

    Alex Robinson, 18 May 2017, In : Proceedings of SPIE - The International Society for Optical Engineering. 10146, 11 p., 1014613.

    Research output: Contribution to journal › Article

  7. Published

    Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography

    Andreas Frommhold & Alex Robinson, 18 May 2017, In : Proceedings of SPIE - The International Society for Optical Engineering. 10143, 9 p., 101430v.

    Research output: Contribution to journal › Article

  8. 2016
  9. Published

    Overview of Materials and Processes for Lithgography

    Alex Robinson, 18 Nov 2016, Materials and Processes for Next Generation Lithography. 1 ed. United Kingdom, Vol. 11. p. 1-90 (Frontiers of Nanoscience; vol. 11).

    Research output: Chapter in Book/Report/Conference proceeding › Chapter

  10. Published

    Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

    Andreas Frommhold, Alex Robinson, 8 Aug 2016, In : Journal of Micro/Nanolithography, MEMS, and MOEMS. 15, 3, 7 p., 033506.

    Research output: Contribution to journal › Article

  11. Published

    Performance of a high resolution chemically amplified electron beam resist at various beam energies

    Richard Palmer, Andreas Frommhold & Alex Robinson, 2 Apr 2016, In : Microelectronic Engineering. 155, p. 97-101

    Research output: Contribution to journal › Article

  12. E-pub ahead of print

    Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning

    Phil Prewett, Alex Robinson, 26 Feb 2016, In : Microelectronic Engineering.

    Research output: Contribution to journal › Article

  13. 2015
  14. Published

    Organic hard masks utilizing fullerene derivatives

    Richard Palmer, Andreas Frommhold, Alex Robinson, 20 Mar 2015, Organic hard masks utilizing fullerene derivatives.

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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