Alex Robinson
Publications
- 2020
- Published
Cisplatin adducts of DNA as precursors for nanostructured catalyst materials
Ruba Hendi, Neil Rees, Alex Robinson & Jim Tucker, 24 Aug 2020, In: Nanoscale Advances. 2, 10, p. 4491-4497 7 p.Research output: Contribution to journal › Article › peer-review
- 2018
- Published
High-resolution EUV lithography using a multi-trigger resist
Wolfgang Theis & Alex Robinson, 19 Mar 2018, Extreme Ultraviolet (EUV) Lithography IX. A. Goldberg, K. (ed.). Society of Photo-Optical Instrumentation Engineers, 105831L. (Proceedings of SPIE; vol. 10583).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
- 2017
- Published
Multi-trigger resist for electron beam lithography
Wolfgang Theis, Alex Robinson, (ed.) & (ed.), 28 Sep 2017, Proceedings of the SPIE. Society of Photo-Optical Instrumentation Engineers, Vol. 10446. 1044608. (SPIE - International Society for Optical Engineering. Proceedings; vol. 10446).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
- Published
Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness
Alex Robinson, 18 May 2017, In: Proceedings of SPIE - The International Society for Optical Engineering. 10143, 13 p., 1014328.Research output: Contribution to journal › Article › peer-review
- Published
Lamellar orientation of block copolymer using polarity switch of Nitrophenyl self-assembled monolayer (SAM) induced by electron beam.
Alex Robinson, 18 May 2017, In: Proceedings of SPIE - The International Society for Optical Engineering. 10146, 11 p., 1014613.Research output: Contribution to journal › Article › peer-review
- Published
Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography
Andreas Frommhold & Alex Robinson, 18 May 2017, In: Proceedings of SPIE - The International Society for Optical Engineering. 10143, 9 p., 101430v.Research output: Contribution to journal › Article › peer-review
- 2016
- Published
Overview of Materials and Processes for Lithgography
Alex Robinson, 18 Nov 2016, Materials and Processes for Next Generation Lithography. 1 ed. United Kingdom, Vol. 11. p. 1-90 (Frontiers of Nanoscience; vol. 11).Research output: Chapter in Book/Report/Conference proceeding › Chapter
- Published
Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet
Andreas Frommhold, Alex Robinson, 8 Aug 2016, In: Journal of Micro/Nanolithography, MEMS, and MOEMS. 15, 3, 7 p., 033506.Research output: Contribution to journal › Article › peer-review
- Published
Performance of a high resolution chemically amplified electron beam resist at various beam energies
Richard Palmer, Andreas Frommhold & Alex Robinson, 2 Apr 2016, In: Microelectronic Engineering. 155, p. 97-101Research output: Contribution to journal › Article › peer-review
- E-pub ahead of print
Helium ion beam lithography on fullerene molecular resists for sub-10 nm patterning
Phil Prewett, Alex Robinson, 26 Feb 2016, In: Microelectronic Engineering.Research output: Contribution to journal › Article › peer-review