Ultrathin fullerene films as high-resolution molecular resists for low-voltage electron-beam lithography

Francis Gibbons; Alexander Robinson; Richard Palmer; Mayandithevar Manickam; Jon Preece

doi:10.1002/smll.200500443

Ultrathin fullerene films as high-resolution molecular resists for low-voltage electron-beam lithography

Francis Gibbons, Alexander Robinson, Richard Palmer, Mayandithevar Manickam, Jon Preece

Research output: Contribution to journal › Article

21 Citations (Scopus)

Original language	English
Pages (from-to)	1003-1006
Number of pages	4
Journal	Small
Volume	2
Issue number	8-9
DOIs	https://doi.org/10.1002/smll.200500443
Publication status	Published - 1 Aug 2006

Keywords

fullerenes
lithography
thin films
electron beams
resists

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10.1002/smll.200500443

PLATFORM: Nanostructured Surfaces
Palmer, R., Guo, Q., Harrison, R., Heath, J., Jones, I., Li, Z., Moss, P. & Robinson, A.
Engineering & Physical Science Research Council
1/12/02 → 31/05/07
Project: Research Councils

Cite this

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title = "Ultrathin fullerene films as high-resolution molecular resists for low-voltage electron-beam lithography",

keywords = "fullerenes, lithography, thin films, electron beams, resists",

author = "Francis Gibbons and Alexander Robinson and Richard Palmer and Mayandithevar Manickam and Jon Preece",

year = "2006",

month = aug,

day = "1",

doi = "10.1002/smll.200500443",

language = "English",

volume = "2",

pages = "1003--1006",

journal = "Small",

issn = "1613-6829",

publisher = "Wiley-VCH Verlag",

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T1 - Ultrathin fullerene films as high-resolution molecular resists for low-voltage electron-beam lithography

AU - Gibbons, Francis

AU - Robinson, Alexander

AU - Palmer, Richard

AU - Manickam, Mayandithevar

AU - Preece, Jon

PY - 2006/8/1

Y1 - 2006/8/1

KW - fullerenes

KW - lithography

KW - thin films

KW - electron beams

KW - resists

U2 - 10.1002/smll.200500443

DO - 10.1002/smll.200500443

M3 - Article

C2 - 17193158

SN - 1613-6829

VL - 2

SP - 1003

EP - 1006

JO - Small

JF - Small

IS - 8-9

ER -

Ultrathin fullerene films as high-resolution molecular resists for low-voltage electron-beam lithography

Keywords

Access to Document

Projects

PLATFORM: Nanostructured Surfaces

Cite this