Ultra-high carbon fullerene-based spin-on-carbon hardmasks

Alan g. Brown; Guy Dawson; Ed a. Jackson; Bryan Schofield; Tom Lada; Alex Robinson

doi:10.1117/12.2658462

Ultra-high carbon fullerene-based spin-on-carbon hardmasks

Alan g. Brown
, Guy Dawson
, Ed a. Jackson
, Bryan Schofield
, Tom Lada
, Alex Robinson

Chemical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

204 Downloads (Pure)

Abstract

Fullerene-based spin-on-carbon enables very high carbon content, and shows very high thermal stability, and etch resistance approaching amorphous carbon. Here we describe the performance of the HM1300 fullerene SOC, including results using high temperature inert atmosphere curing. Ohnishi numbers below 1.44 are achieved (measured by elemental analysis) and etch performance improved over the standard bake. A new high carbon crosslinker, designed to link directly to the fullerene cage, and with a carbon content comparable to the fullerene (significantly higher than the previous crosslinker) is also introduced. The new crosslinker is designed to enhance both etch and thermal stability performance.

Original language	English
Title of host publication	Advances in Patterning Materials and Processes XL
Publisher	Society of Photo-Optical Instrumentation Engineers
Pages	66
ISBN (Electronic)	9781510661042
ISBN (Print)	9781510661035
DOIs	https://doi.org/10.1117/12.2658462
Publication status	Published - 30 Apr 2023
Event	Advances in Patterning Materials and Processes XL - San Jose, United States Duration: 26 Feb 2023 → 2 Mar 2023

Publication series

Name	Proceedings of SPIE
Publisher	SPIE
Volume	12498
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Advances in Patterning Materials and Processes XL
Period	26/02/23 → 2/03/23

Access to Document

10.1117/12.2658462Licence: None: All rights reserved

BrownAG2024Ultra-high_preprintSubmitted manuscript, 2.32 MBLicence: None: All rights reserved

Cite this

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title = "Ultra-high carbon fullerene-based spin-on-carbon hardmasks",

abstract = "Fullerene-based spin-on-carbon enables very high carbon content, and shows very high thermal stability, and etch resistance approaching amorphous carbon. Here we describe the performance of the HM1300 fullerene SOC, including results using high temperature inert atmosphere curing. Ohnishi numbers below 1.44 are achieved (measured by elemental analysis) and etch performance improved over the standard bake. A new high carbon crosslinker, designed to link directly to the fullerene cage, and with a carbon content comparable to the fullerene (significantly higher than the previous crosslinker) is also introduced. The new crosslinker is designed to enhance both etch and thermal stability performance.",

author = "Brown, \{Alan g.\} and Guy Dawson and Jackson, \{Ed a.\} and Bryan Schofield and Tom Lada and Alex Robinson",

year = "2023",

month = apr,

day = "30",

doi = "10.1117/12.2658462",

language = "English",

isbn = "9781510661035",

series = "Proceedings of SPIE",

publisher = "Society of Photo-Optical Instrumentation Engineers",

pages = "66",

booktitle = "Advances in Patterning Materials and Processes XL",

address = "United States",

note = "Advances in Patterning Materials and Processes XL ; Conference date: 26-02-2023 Through 02-03-2023",

}

Brown, AG, Dawson, G, Jackson, EA, Schofield, B, Lada, T & Robinson, A 2023, Ultra-high carbon fullerene-based spin-on-carbon hardmasks. in Advances in Patterning Materials and Processes XL. Proceedings of SPIE, vol. 12498, Society of Photo-Optical Instrumentation Engineers, pp. 66, Advances in Patterning Materials and Processes XL, 26/02/23. https://doi.org/10.1117/12.2658462

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T1 - Ultra-high carbon fullerene-based spin-on-carbon hardmasks

AU - Brown, Alan g.

AU - Dawson, Guy

AU - Jackson, Ed a.

AU - Schofield, Bryan

AU - Lada, Tom

AU - Robinson, Alex

PY - 2023/4/30

Y1 - 2023/4/30

N2 - Fullerene-based spin-on-carbon enables very high carbon content, and shows very high thermal stability, and etch resistance approaching amorphous carbon. Here we describe the performance of the HM1300 fullerene SOC, including results using high temperature inert atmosphere curing. Ohnishi numbers below 1.44 are achieved (measured by elemental analysis) and etch performance improved over the standard bake. A new high carbon crosslinker, designed to link directly to the fullerene cage, and with a carbon content comparable to the fullerene (significantly higher than the previous crosslinker) is also introduced. The new crosslinker is designed to enhance both etch and thermal stability performance.

AB - Fullerene-based spin-on-carbon enables very high carbon content, and shows very high thermal stability, and etch resistance approaching amorphous carbon. Here we describe the performance of the HM1300 fullerene SOC, including results using high temperature inert atmosphere curing. Ohnishi numbers below 1.44 are achieved (measured by elemental analysis) and etch performance improved over the standard bake. A new high carbon crosslinker, designed to link directly to the fullerene cage, and with a carbon content comparable to the fullerene (significantly higher than the previous crosslinker) is also introduced. The new crosslinker is designed to enhance both etch and thermal stability performance.

U2 - 10.1117/12.2658462

DO - 10.1117/12.2658462

M3 - Conference contribution

SN - 9781510661035

T3 - Proceedings of SPIE

SP - 66

BT - Advances in Patterning Materials and Processes XL

PB - Society of Photo-Optical Instrumentation Engineers

T2 - Advances in Patterning Materials and Processes XL

Y2 - 26 February 2023 through 2 March 2023

ER -

Ultra-high carbon fullerene-based spin-on-carbon hardmasks

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