Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography

Richard Palmer, Andreas Frommhold, Alexander Robinson, Dongxu Yang, Alexandra McClelland, John Roth, Yasin Ekinci, Mark Rosamond

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

8 Citations (Scopus)

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Physics & Astronomy