W-containing carbon coatings were deposited on plain carbon steel and titanium substrates by Combined Magnetron Sputtering and Ion Implantation (CMSII) technique. A target made of fine grain graphite with cylindrical tungsten pins mounted in the area of maximum sputtering rate was used. High voltage pulses (-30 kV, 20 mu s, and 25 Hz) were superposed over the DC bias. By adjusting the processing parameters nanocomposite nc-WC1-x/a-C coatings with a W content from 20 to 45 at.%, with a hardness of 12-22 GPa and a friction coefficient in the range of 0.12-0.22 were produced. These coatings have a thickness of 10-13 mu m, good wear resistance and a good thermal stability up to 673 K. (C) 2011 Elsevier B.V. All rights reserved.
- Ion implantation
- Magnetron sputtering