Keyphrases
Pinhole Defect
100%
Fullerene
100%
Chemical Amplification
100%
Electron Beam Resist
100%
Spin Coating
100%
Aging
66%
Defect Density
66%
Molecular Resist
66%
Cleanliness
33%
Low Density
33%
Good Quality
33%
Polymeric Materials
33%
Successful Implementation
33%
Cross-linker
33%
Atomic Force Microscopy
33%
Epoxy
33%
Low Sensitivity
33%
Fullerene Films
33%
Pin Density
33%
Line Width Roughness
33%
Ultrathin
33%
Low Linewidth
33%
Carbon-rich Molecules
33%
Hydrogen-terminated Silicon
33%
Next Generation Lithography
33%
Material Science
Film
100%
Fullerene
100%
Density
50%
Spin Coating
50%
Defect Density
33%
Thin Films
16%
Silicon
16%
Linewidth
16%
Poly Methyl Methacrylate
16%
Polymer
16%
Lithography
16%
Engineering
Fullerene
100%
Defect Density
50%
Thin Films
25%
High Resolution
25%
Line Width
25%
Lithography
25%
Crosslinker
25%
Atomic Force Microscopy
25%
Main Problem
25%
Successful Implementation
25%
Chemical Engineering
Film
100%
Fullerene
100%
Spin Coating
42%
Lithography
14%
Pharmacology, Toxicology and Pharmaceutical Science
Fullerene
100%
Polymer
33%
Fullerene Derivative
33%
Atomic Force Microscopy
33%