Rapid Patterning of Low-Viscosity Resists Using Electrohydrodynamic Lithography

Pola Goldberg Oppenheimer

doi:10.1007/978-3-319-0078304

Rapid Patterning of Low-Viscosity Resists Using Electrohydrodynamic Lithography

Pola Goldberg Oppenheimer

Chemical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Chapter (peer-reviewed) › peer-review

Abstract

Lithography is a constantly developing field, that is essential for many advanced technologies. Establishing the ability to pattern materials with high fidelity and resolution without compromising their properties is therefore important. The rapid pace of technological advancements triggers continual developments of cost effective lithographic schemes which eventually will enable the fabrication of a broad spectrum of structures in a controlled manner within extremely short periods of time.

Original language	English
Title of host publication	Electrohydrodynamic Patterning of Functional Materials
Publisher	Springer
Chapter	4
Pages	47-61
ISBN (Electronic)	9783319007830
ISBN (Print)	9783319007823, 9783319033778
DOIs	https://doi.org/10.1007/978-3-319-0078304
Publication status	Published - 24 Jul 2013

Publication series

Name	Springer Theses
Publisher	Springer
ISSN (Print)	2190-5053
ISSN (Electronic)	2190-5061

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10.1007/978-3-319-0078304Licence: None: All rights reserved

1 Book

Electrohydrodynamic Patterning of Functional Materials
Goldberg Oppenheimer, P., 7 Aug 2013, 1 ed. Springer. (Springer Theses)
Research output: Book/Report › Book

Cite this

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abstract = "Lithography is a constantly developing field, that is essential for many advanced technologies. Establishing the ability to pattern materials with high fidelity and resolution without compromising their properties is therefore important. The rapid pace of technological advancements triggers continual developments of cost effective lithographic schemes which eventually will enable the fabrication of a broad spectrum of structures in a controlled manner within extremely short periods of time.",

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AB - Lithography is a constantly developing field, that is essential for many advanced technologies. Establishing the ability to pattern materials with high fidelity and resolution without compromising their properties is therefore important. The rapid pace of technological advancements triggers continual developments of cost effective lithographic schemes which eventually will enable the fabrication of a broad spectrum of structures in a controlled manner within extremely short periods of time.

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M3 - Chapter (peer-reviewed)

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T3 - Springer Theses

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BT - Electrohydrodynamic Patterning of Functional Materials

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Rapid Patterning of Low-Viscosity Resists Using Electrohydrodynamic Lithography

Abstract

Publication series

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Research output

Electrohydrodynamic Patterning of Functional Materials

Cite this