Abstract
We report a quantitative investigation of direct electron beam writing in monolayer films of passivated gold nanoclusters. In this process, the passivating organic ligands are (partially) removed to create gold-based nanostructures. We report the fabrication of lines with width as narrow as 26 nm, while measurements of the linewidth as a function of dose allow us to obtain a quantitative measure of the sensitivity, for comparison with established negative tone resists. (C) 2001 American Institute of Physics.
| Original language | English |
|---|---|
| Pages (from-to) | 1921-1923 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 78 |
| Issue number | 13 |
| DOIs | |
| Publication status | Published - 1 Jan 2001 |
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