Patterned deposition from compressed carbon dioxide

C. K. Luscombe*, W. T S Huck, A. B. Holmes, T. Lu, G. A. Leeke, R. C D Santos, B. Al-Duri, J. P K Seville

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)


Compressed CO2 is employed as the solvent for the deposition of polymers onto patterned surfaces created by a lithographic technique. This deposition technique should have wide applicability in the deposition of organic and polymeric materials for optoelectronic devices. The advantage of controlled deposition confers a further benefit in the control of the patterned surface. In a specific example a perfluorinated polymer was dissolved in liquid carbon dioxide. The polymer solution was deposited by use of a nozzle onto a pre-patterned surface. The resulting polymer film showed a clear image of the original pattern as measured by optical microscopy.

Original languageEnglish
Pages (from-to)103-108
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - 30 Jun 2003
EventPolymer/Metal Interfaces and Defect Mediated Phenomena in Ordered Polymers - Boston, MA, United States
Duration: 2 Dec 20026 Dec 2002

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials


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