On the diffusion behaviour of Os in the binary Ni-Os system

YM Youssef, PD Lee, KC Mills, Roger Reed

Research output: Contribution to journalArticle

5 Citations (Scopus)


The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350 degrees C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the high temperature properties of the nickel-based superalloys.
Original languageEnglish
Pages (from-to)1173-1176
Number of pages4
JournalMaterials Science and Technology
Issue number10
Publication statusPublished - 1 Oct 2010


  • Nickel-based superalloys
  • Microstructural kinetics
  • Diffusion
  • High temperature properties


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