On the diffusion behaviour of Os in the binary Ni-Os system

YM Youssef; PD Lee; KC Mills; Roger Reed

doi:10.1179/026708310X12701095964720

On the diffusion behaviour of Os in the binary Ni-Os system

YM Youssef, PD Lee, KC Mills, Roger Reed

Metallurgy and Materials

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5 Citations (Scopus)

Abstract

The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350 degrees C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the high temperature properties of the nickel-based superalloys.

Original language	English
Pages (from-to)	1173-1176
Number of pages	4
Journal	Materials Science and Technology
Volume	26
Issue number	10
DOIs	https://doi.org/10.1179/026708310X12701095964720
Publication status	Published - 1 Oct 2010

Keywords

Nickel-based superalloys
Microstructural kinetics
Diffusion
High temperature properties

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10.1179/026708310X12701095964720

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title = "On the diffusion behaviour of Os in the binary Ni-Os system",

abstract = "The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350 degrees C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the high temperature properties of the nickel-based superalloys.",

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author = "YM Youssef and PD Lee and KC Mills and Roger Reed",

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AU - Youssef, YM

AU - Lee, PD

AU - Mills, KC

AU - Reed, Roger

PY - 2010/10/1

Y1 - 2010/10/1

N2 - The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350 degrees C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the high temperature properties of the nickel-based superalloys.

AB - The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350 degrees C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the high temperature properties of the nickel-based superalloys.

KW - Nickel-based superalloys

KW - Microstructural kinetics

KW - Diffusion

KW - High temperature properties

U2 - 10.1179/026708310X12701095964720

DO - 10.1179/026708310X12701095964720

M3 - Article

SN - 1743-2847

VL - 26

SP - 1173

EP - 1176

JO - Materials Science and Technology

JF - Materials Science and Technology

IS - 10

ER -

On the diffusion behaviour of Os in the binary Ni-Os system

Abstract

Keywords

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