Transmission electron microscopy has been used to reveal the microstructure of metastable C40 MOSi2 thin films produced by annealing amorphous magnetron-sputtered deposits at 700degreesC. The films contain nanoscale acicular grains elongated parallel to (0001), with extensive basal faulting. The faults are intrinsic with R = 13 and correspond to thin slabs of the equilibrium C11(b) phase. It is proposed that these faults may act as nuclei for the subsequent transformation from C40 to C11(b) by a process akin to discontinuous coarsening.
|Number of pages||8|
|Journal||Philosophical Magazine Letters|
|Publication status||Published - 1 Dec 2002|