Nucleation of the C40-to-C11(b) transformation in magnetron-sputtered MoSi2 thin films

XY Wang; Isaac Chang; Mark Aindow

doi:10.1080/0950083021000038083

Nucleation of the C40-to-C11(b) transformation in magnetron-sputtered MoSi2 thin films

XY Wang, Isaac Chang, Mark Aindow

Metallurgy and Materials

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Abstract

Transmission electron microscopy has been used to reveal the microstructure of metastable C40 MOSi2 thin films produced by annealing amorphous magnetron-sputtered deposits at 700degreesC. The films contain nanoscale acicular grains elongated parallel to (0001), with extensive basal faulting. The faults are intrinsic with R = 13[0001] and correspond to thin slabs of the equilibrium C11(b) phase. It is proposed that these faults may act as nuclei for the subsequent transformation from C40 to C11(b) by a process akin to discontinuous coarsening.

Original language	English
Pages (from-to)	687-694
Number of pages	8
Journal	Philosophical Magazine Letters
Volume	82
Issue number	12
DOIs	https://doi.org/10.1080/0950083021000038083
Publication status	Published - 1 Dec 2002

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10.1080/0950083021000038083

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title = "Nucleation of the C40-to-C11(b) transformation in magnetron-sputtered MoSi2 thin films",

abstract = "Transmission electron microscopy has been used to reveal the microstructure of metastable C40 MOSi2 thin films produced by annealing amorphous magnetron-sputtered deposits at 700degreesC. The films contain nanoscale acicular grains elongated parallel to (0001), with extensive basal faulting. The faults are intrinsic with R = 13[0001] and correspond to thin slabs of the equilibrium C11(b) phase. It is proposed that these faults may act as nuclei for the subsequent transformation from C40 to C11(b) by a process akin to discontinuous coarsening.",

author = "XY Wang and Isaac Chang and Mark Aindow",

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AU - Aindow, Mark

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N2 - Transmission electron microscopy has been used to reveal the microstructure of metastable C40 MOSi2 thin films produced by annealing amorphous magnetron-sputtered deposits at 700degreesC. The films contain nanoscale acicular grains elongated parallel to (0001), with extensive basal faulting. The faults are intrinsic with R = 13[0001] and correspond to thin slabs of the equilibrium C11(b) phase. It is proposed that these faults may act as nuclei for the subsequent transformation from C40 to C11(b) by a process akin to discontinuous coarsening.

AB - Transmission electron microscopy has been used to reveal the microstructure of metastable C40 MOSi2 thin films produced by annealing amorphous magnetron-sputtered deposits at 700degreesC. The films contain nanoscale acicular grains elongated parallel to (0001), with extensive basal faulting. The faults are intrinsic with R = 13[0001] and correspond to thin slabs of the equilibrium C11(b) phase. It is proposed that these faults may act as nuclei for the subsequent transformation from C40 to C11(b) by a process akin to discontinuous coarsening.

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DO - 10.1080/0950083021000038083

M3 - Article

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VL - 82

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EP - 694

JO - Philosophical Magazine Letters

JF - Philosophical Magazine Letters

IS - 12

ER -

Nucleation of the C40-to-C11(b) transformation in magnetron-sputtered MoSi2 thin films

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