Multi-trigger resist for electron beam and extreme ultraviolet lithography

C. Popescu; A. McClelland; D. Kazazis; G. Dawson; J. Roth; Y. Ekinci; W. Theis; A. P.G. Robinson

doi:10.1117/12.2316628

Multi-trigger resist for electron beam and extreme ultraviolet lithography

C. Popescu
, A. McClelland
, D. Kazazis
, G. Dawson
, J. Roth
, Y. Ekinci
, W. Theis
, A. P.G. Robinson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The multi-trigger resist (MTR) is a new negative tone molecular resist platform for electron beam lithography, as well as extreme ultraviolet and optical lithography. The performance of xMT resist, the precursor to MTR resist, which shows a good combination of sensitivity, low line edge roughness and high-resolution patterning has previously been reported.[1] In order to overcome limitations induced by acid diffusion, a new mechanism-the multi-trigger concept-has been introduced. The results obtained so far as the behaviour of the resist is driven towards the multi-trigger regime by manipulating the resist formulation are presented. A feature size of 13 nm in semi-dense (1:1.5 line/space) patterns, and 22nm diameter pillar patterns are demonstrated in electron beam, and 16 nm half-pitch resolution patterns are demonstrated in (extreme ultraviolet) EUV. An improvement in the LER value is seen in the higher MTR formulations.

Original language	English
Title of host publication	34th European Mask and Lithography Conference
Editors	Uwe F.W. Behringer, Jo Finders
Publisher	Society of Photo-Optical Instrumentation Engineers
ISBN (Print)	9781510621213
DOIs	https://doi.org/10.1117/12.2316628
Publication status	Published - 2018
Event	34th European Mask and Lithography Conference, EMLC 2018 - Grenoble, France Duration: 18 Jun 2018 → 20 Jun 2018

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	10775
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	34th European Mask and Lithography Conference, EMLC 2018
Country/Territory	France
City	Grenoble
Period	18/06/18 → 20/06/18

Bibliographical note

Publisher Copyright:
© 2018 SPIE.

Keywords

molecular resist
Multi-trigger
quencher stochastics

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.2316628

Cite this

Popescu, C., McClelland, A., Kazazis, D., Dawson, G., Roth, J., Ekinci, Y., Theis, W., & Robinson, A. P. G. (2018). Multi-trigger resist for electron beam and extreme ultraviolet lithography. In U. F. W. Behringer, & J. Finders (Eds.), 34th European Mask and Lithography Conference Article 1077502 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10775). Society of Photo-Optical Instrumentation Engineers. https://doi.org/10.1117/12.2316628

@inproceedings{fe81becd81f14b64b2b6f009294be374,

title = "Multi-trigger resist for electron beam and extreme ultraviolet lithography",

abstract = "The multi-trigger resist (MTR) is a new negative tone molecular resist platform for electron beam lithography, as well as extreme ultraviolet and optical lithography. The performance of xMT resist, the precursor to MTR resist, which shows a good combination of sensitivity, low line edge roughness and high-resolution patterning has previously been reported.[1] In order to overcome limitations induced by acid diffusion, a new mechanism-the multi-trigger concept-has been introduced. The results obtained so far as the behaviour of the resist is driven towards the multi-trigger regime by manipulating the resist formulation are presented. A feature size of 13 nm in semi-dense (1:1.5 line/space) patterns, and 22nm diameter pillar patterns are demonstrated in electron beam, and 16 nm half-pitch resolution patterns are demonstrated in (extreme ultraviolet) EUV. An improvement in the LER value is seen in the higher MTR formulations.",

keywords = "molecular resist, Multi-trigger, quencher stochastics",

author = "C. Popescu and A. McClelland and D. Kazazis and G. Dawson and J. Roth and Y. Ekinci and W. Theis and Robinson, \{A. P.G.\}",

note = "Publisher Copyright: {\textcopyright} 2018 SPIE.; 34th European Mask and Lithography Conference, EMLC 2018 ; Conference date: 18-06-2018 Through 20-06-2018",

year = "2018",

doi = "10.1117/12.2316628",

language = "English",

isbn = "9781510621213",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "Society of Photo-Optical Instrumentation Engineers",

editor = "Behringer, \{Uwe F.W.\} and Jo Finders",

booktitle = "34th European Mask and Lithography Conference",

address = "United States",

}

Popescu, C, McClelland, A, Kazazis, D, Dawson, G, Roth, J, Ekinci, Y, Theis, W & Robinson, APG 2018, Multi-trigger resist for electron beam and extreme ultraviolet lithography. in UFW Behringer & J Finders (eds), 34th European Mask and Lithography Conference., 1077502, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10775, Society of Photo-Optical Instrumentation Engineers, 34th European Mask and Lithography Conference, EMLC 2018, Grenoble, France, 18/06/18. https://doi.org/10.1117/12.2316628

Multi-trigger resist for electron beam and extreme ultraviolet lithography. / Popescu, C.; McClelland, A.; Kazazis, D. et al.
34th European Mask and Lithography Conference. ed. / Uwe F.W. Behringer; Jo Finders. Society of Photo-Optical Instrumentation Engineers, 2018. 1077502 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10775).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Multi-trigger resist for electron beam and extreme ultraviolet lithography

AU - Popescu, C.

AU - McClelland, A.

AU - Kazazis, D.

AU - Dawson, G.

AU - Roth, J.

AU - Ekinci, Y.

AU - Theis, W.

AU - Robinson, A. P.G.

PY - 2018

Y1 - 2018

N2 - The multi-trigger resist (MTR) is a new negative tone molecular resist platform for electron beam lithography, as well as extreme ultraviolet and optical lithography. The performance of xMT resist, the precursor to MTR resist, which shows a good combination of sensitivity, low line edge roughness and high-resolution patterning has previously been reported.[1] In order to overcome limitations induced by acid diffusion, a new mechanism-the multi-trigger concept-has been introduced. The results obtained so far as the behaviour of the resist is driven towards the multi-trigger regime by manipulating the resist formulation are presented. A feature size of 13 nm in semi-dense (1:1.5 line/space) patterns, and 22nm diameter pillar patterns are demonstrated in electron beam, and 16 nm half-pitch resolution patterns are demonstrated in (extreme ultraviolet) EUV. An improvement in the LER value is seen in the higher MTR formulations.

AB - The multi-trigger resist (MTR) is a new negative tone molecular resist platform for electron beam lithography, as well as extreme ultraviolet and optical lithography. The performance of xMT resist, the precursor to MTR resist, which shows a good combination of sensitivity, low line edge roughness and high-resolution patterning has previously been reported.[1] In order to overcome limitations induced by acid diffusion, a new mechanism-the multi-trigger concept-has been introduced. The results obtained so far as the behaviour of the resist is driven towards the multi-trigger regime by manipulating the resist formulation are presented. A feature size of 13 nm in semi-dense (1:1.5 line/space) patterns, and 22nm diameter pillar patterns are demonstrated in electron beam, and 16 nm half-pitch resolution patterns are demonstrated in (extreme ultraviolet) EUV. An improvement in the LER value is seen in the higher MTR formulations.

KW - molecular resist

KW - Multi-trigger

KW - quencher stochastics

UR - https://www.scopus.com/pages/publications/85054688464

U2 - 10.1117/12.2316628

DO - 10.1117/12.2316628

M3 - Conference contribution

AN - SCOPUS:85054688464

SN - 9781510621213

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - 34th European Mask and Lithography Conference

A2 - Behringer, Uwe F.W.

A2 - Finders, Jo

PB - Society of Photo-Optical Instrumentation Engineers

T2 - 34th European Mask and Lithography Conference, EMLC 2018

Y2 - 18 June 2018 through 20 June 2018

ER -

Popescu C, McClelland A, Kazazis D, Dawson G, Roth J, Ekinci Y et al. Multi-trigger resist for electron beam and extreme ultraviolet lithography. In Behringer UFW, Finders J, editors, 34th European Mask and Lithography Conference. Society of Photo-Optical Instrumentation Engineers. 2018. 1077502. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2316628

Multi-trigger resist for electron beam and extreme ultraviolet lithography

Abstract

Publication series

Conference

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

Fingerprint

Cite this