Multi-adduct derivatives of C-60 for electron beam nano-resists

T Tada; K Uekusa; T Kanayama; T Nakayama; R Chapman; WY Cheung; L Eden; I Hussain; M Jennings; J Perkins; M Phillips; Jon Preece; E Shelley

doi:10.1016/S0167-9317(02)00541-5

Multi-adduct derivatives of C-60 for electron beam nano-resists

T Tada, K Uekusa, T Kanayama, T Nakayama, R Chapman, WY Cheung, L Eden, I Hussain, M Jennings, J Perkins, M Phillips, Jon Preece, E Shelley

Chemistry

Research output: Contribution to conference (unpublished) › Paper

4 Citations (Scopus)

Original language	English
Pages	737-743
Number of pages	7
DOIs	https://doi.org/10.1016/S0167-9317(02)00541-5
Publication status	Published - 1 Jul 2002
Event	27th International Conference on Micro- and Nano-Engineering, Sep 16-19, 2001. GRENOBLE, Spain - Duration: 1 Jul 2002 → …

Conference

Conference	27th International Conference on Micro- and Nano-Engineering, Sep 16-19, 2001. GRENOBLE, Spain
Period	1/07/02 → …

Keywords

fullerene
C-60
electron beam resist
nanolithography
methanofullerene

Access to Document

10.1016/S0167-9317(02)00541-5

Cite this

Tada, T., Uekusa, K., Kanayama, T., Nakayama, T., Chapman, R., Cheung, WY., Eden, L., Hussain, I., Jennings, M., Perkins, J., Phillips, M., Preece, J., & Shelley, E. (2002). Multi-adduct derivatives of C-60 for electron beam nano-resists. 737-743. Paper presented at 27th International Conference on Micro- and Nano-Engineering, Sep 16-19, 2001. GRENOBLE, Spain. https://doi.org/10.1016/S0167-9317(02)00541-5

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title = "Multi-adduct derivatives of C-60 for electron beam nano-resists",

keywords = "fullerene, C-60, electron beam resist, nanolithography, methanofullerene",

author = "T Tada and K Uekusa and T Kanayama and T Nakayama and R Chapman and WY Cheung and L Eden and I Hussain and M Jennings and J Perkins and M Phillips and Jon Preece and E Shelley",

year = "2002",

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doi = "10.1016/S0167-9317(02)00541-5",

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Tada, T, Uekusa, K, Kanayama, T, Nakayama, T, Chapman, R, Cheung, WY, Eden, L, Hussain, I, Jennings, M, Perkins, J, Phillips, M, Preece, J & Shelley, E 2002, 'Multi-adduct derivatives of C-60 for electron beam nano-resists', Paper presented at 27th International Conference on Micro- and Nano-Engineering, Sep 16-19, 2001. GRENOBLE, Spain, 1/07/02 pp. 737-743. https://doi.org/10.1016/S0167-9317(02)00541-5

TY - CONF

T1 - Multi-adduct derivatives of C-60 for electron beam nano-resists

AU - Tada, T

AU - Uekusa, K

AU - Kanayama, T

AU - Nakayama, T

AU - Chapman, R

AU - Cheung, WY

AU - Eden, L

AU - Hussain, I

AU - Jennings, M

AU - Perkins, J

AU - Phillips, M

AU - Preece, Jon

AU - Shelley, E

PY - 2002/7/1

Y1 - 2002/7/1

KW - fullerene

KW - C-60

KW - electron beam resist

KW - nanolithography

KW - methanofullerene

U2 - 10.1016/S0167-9317(02)00541-5

DO - 10.1016/S0167-9317(02)00541-5

M3 - Paper

SP - 737

EP - 743

T2 - 27th International Conference on Micro- and Nano-Engineering, Sep 16-19, 2001. GRENOBLE, Spain

Y2 - 1 July 2002

ER -