TY - JOUR
T1 - Machining of electrically conductive CVD diamond tool blanks using EDM
AU - Olsen, RH
AU - Dewes, Richard
AU - Aspinwall, David
PY - 2004/9/2
Y1 - 2004/9/2
N2 - The paper reviews the manufacture, microstructure and physical/mechanical properties of thick film chemical vapour deposited (CVD) diamond in relation to its use for cutting tools. In contrast to polycrystalline diamond (PCD), CVD diamond contains no metallic second phase, its microstructure comprising solely of columnar diamond grains. Experimental research involving an L27 Taguchi orthogonal array is presented relating to the electrical discharge wire machining (EDWM) of boron-doped CVD diamond. The work was carried out in order to establish the effect of generator operating parameters (voltage, current, on-time, off-time) on cutting speed and diamond surface/edge roughness (R-a, mum), when rough machining. Cutting speed results were obtained between similar to0.2 and 1.5 mm/min. Surface roughness ranged from similar to0.6 to 1.3 mum R-a while edge roughness was from similar to0.7 to 2.0 mum R-a. (C) 2004 Elsevier B.V. All rights reserved.
AB - The paper reviews the manufacture, microstructure and physical/mechanical properties of thick film chemical vapour deposited (CVD) diamond in relation to its use for cutting tools. In contrast to polycrystalline diamond (PCD), CVD diamond contains no metallic second phase, its microstructure comprising solely of columnar diamond grains. Experimental research involving an L27 Taguchi orthogonal array is presented relating to the electrical discharge wire machining (EDWM) of boron-doped CVD diamond. The work was carried out in order to establish the effect of generator operating parameters (voltage, current, on-time, off-time) on cutting speed and diamond surface/edge roughness (R-a, mum), when rough machining. Cutting speed results were obtained between similar to0.2 and 1.5 mm/min. Surface roughness ranged from similar to0.6 to 1.3 mum R-a while edge roughness was from similar to0.7 to 2.0 mum R-a. (C) 2004 Elsevier B.V. All rights reserved.
UR - http://www.scopus.com/inward/record.url?scp=2942511489&partnerID=8YFLogxK
U2 - 10.1016/j.jmatprotec.2003.11.052
DO - 10.1016/j.jmatprotec.2003.11.052
M3 - Article
VL - 149
SP - 627
EP - 632
JO - Journal of Materials Processing Technology
JF - Journal of Materials Processing Technology
IS - 1-3
ER -