Skip to main navigation Skip to search Skip to main content

Low voltage thin film transistors based on solution-processed In2O3:W. A remarkably stable semiconductor under negative and positive bias stress

  • Kosta Paxinos
  • , Giorgos Antoniou
  • , Dimitrios Afouxenidis
  • , Ahmed Mohamed
  • , Umar Dikko
  • , Ioannis Tsitsimpelis
  • , William I. Milne
  • , Arokia Nathan
  • , George Adamopoulos

Research output: Contribution to journal › Article › peer-review

Abstract

Thin film transistors (TFTs) based on metal oxide semiconductors have been attracting considerable attention over the last two decades as
alternatives to a-Si due to their superior electrical performance coupled with optical transparency to visible light and mechanical flexibility.
They have become highly desirable for applications in backplane electronics for active-matrix organic light-emitting diodes including flexible
displays and other newly emerging areas. Indeed, the performance of oxide-based TFTs, i.e., the carrier mobility, exceeds that of amorphous
a-Si-based TFTs, and their stability characteristics exceed those of organic semiconductors.
Original languageEnglish
Pages (from-to)63505-1
Number of pages163505
JournalApplied Physics Letters
Volume226
Publication statusPublished - 24 Apr 2020

Fingerprint

Dive into the research topics of 'Low voltage thin film transistors based on solution-processed In2O3:W. A remarkably stable semiconductor under negative and positive bias stress'. Together they form a unique fingerprint.

Cite this