Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness

Warren Montgomery; Alexandra McClelland; David Ure; John Roth; Alexander Robinson

doi:10.1117/12.2258092

Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness

Warren Montgomery, Alexandra McClelland, David Ure, John Roth, Alexander Robinson

Chemical Engineering

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6 Citations (Scopus)

699 Downloads (Pure)

Abstract

Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.

Original language	English
Article number	1014328
Number of pages	13
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	10143
DOIs	https://doi.org/10.1117/12.2258092
Publication status	Published - 18 May 2017

Keywords

EUV Photoresist
resolution
molecular
contacts holes
volume manufacturing
high resolution

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10.1117/12.2258092Licence: Creative Commons: Attribution (CC BY)

1014328Final published version, 1.01 MBLicence: Creative Commons: Attribution (CC BY)

Cite this

@article{f7ebf004a650443e8c35f8618720f6d3,

title = "Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness",

abstract = "Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.",

keywords = "EUV Photoresist, resolution, molecular, contacts holes, volume manufacturing, high resolution",

author = "Warren Montgomery and Alexandra McClelland and David Ure and John Roth and Alexander Robinson",

year = "2017",

month = may,

day = "18",

doi = "10.1117/12.2258092",

language = "English",

volume = "10143",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "Society of Photo-Optical Instrumentation Engineers",

}

TY - JOUR

T1 - Irresistible Materials multi-trigger resist

T2 - the journey towards high volume manufacturing readiness

AU - Montgomery, Warren

AU - McClelland, Alexandra

AU - Ure, David

AU - Roth, John

AU - Robinson, Alexander

PY - 2017/5/18

Y1 - 2017/5/18

N2 - Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.

AB - Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.

KW - EUV Photoresist

KW - resolution

KW - molecular

KW - contacts holes

KW - volume manufacturing

KW - high resolution

U2 - 10.1117/12.2258092

DO - 10.1117/12.2258092

M3 - Article

SN - 0277-786X

VL - 10143

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 1014328

ER -

Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness

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Keywords

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