Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering

G Abadias; Yau Tse; PH Guerin; V Pelosin

doi:10.1063/1.2197287

Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering

G Abadias
, Yau Tse
, PH Guerin
, V Pelosin

Metallurgy and Materials

Research output: Contribution to journal › Article

109 Citations (Scopus)

Original language	English
Pages (from-to)	113519-1-13
Journal	Journal of Applied Physics
Volume	99
Issue number	11
DOIs	https://doi.org/10.1063/1.2197287
Publication status	Published - 1 Jan 2006

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10.1063/1.2197287

Cite this

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title = "Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering",

author = "G Abadias and Yau Tse and PH Guerin and V Pelosin",

year = "2006",

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doi = "10.1063/1.2197287",

language = "English",

volume = "99",

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journal = "Journal of Applied Physics",

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publisher = "American Institute of Physics",

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AU - Abadias, G

AU - Tse, Yau

AU - Guerin, PH

AU - Pelosin, V

PY - 2006/1/1

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VL - 99

SP - 113519-1-13

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

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