Implantation studies of keV positive muons in thin metallic layers

E Morenzoni, H Gluckler, T Prokscha, R Khasanov, H Luetkens, M Birke, Edward Forgan, C Niedermayer

Research output: Contribution to journalArticle

92 Citations (Scopus)

Abstract

The implantation of low energy polarized positive muons (mu(+)) with energies between 0.5 and 30 keV in thin (
Original languageEnglish
Pages (from-to)254-266
Number of pages13
JournalNuclear Instruments & Methods in Physics Research. Section B. Beam Interactions With Materials and Atoms
Volume192
Issue number3
DOIs
Publication statusPublished - 1 May 2002

Keywords

  • implantation profiles
  • muon spin rotation
  • muon energy loss
  • low energy muons

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