Hydrogen in aluminium oxide films grown for silicon surface passivation by plasma-enhanced atomic layer deposition

Sophie L. Pain; Luke Wilkins; Matthew K. Sharpe; Callum D. McAleese; Kelsey J. Hall; John D. Murphy; Nicholas E. Grant

doi:10.1016/j.apsusc.2026.166660

Hydrogen in aluminium oxide films grown for silicon surface passivation by plasma-enhanced atomic layer deposition

Sophie L. Pain
, Luke Wilkins
, Matthew K. Sharpe
, Callum D. McAleese
, Kelsey J. Hall
, John D. Murphy
, Nicholas E. Grant

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	166660
Journal	Applied Surface Science
DOIs	https://doi.org/10.1016/j.apsusc.2026.166660
Publication status	Published - 1 Mar 2026

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10.1016/j.apsusc.2026.166660

https://linkinghub.elsevier.com/retrieve/pii/S0169433226008640

Cite this

@article{868c091b5ef34f18aa69f14c7a9b457b,

title = "Hydrogen in aluminium oxide films grown for silicon surface passivation by plasma-enhanced atomic layer deposition",

author = "Pain, \{Sophie L.\} and Luke Wilkins and Sharpe, \{Matthew K.\} and McAleese, \{Callum D.\} and Hall, \{Kelsey J.\} and Murphy, \{John D.\} and Grant, \{Nicholas E.\}",

year = "2026",

month = mar,

day = "1",

doi = "10.1016/j.apsusc.2026.166660",

language = "English",

pages = "166660",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "North-Holland Publ Co",

}

TY - JOUR

T1 - Hydrogen in aluminium oxide films grown for silicon surface passivation by plasma-enhanced atomic layer deposition

AU - Pain, Sophie L.

AU - Wilkins, Luke

AU - Sharpe, Matthew K.

AU - McAleese, Callum D.

AU - Hall, Kelsey J.

AU - Murphy, John D.

AU - Grant, Nicholas E.

PY - 2026/3/1

Y1 - 2026/3/1

U2 - 10.1016/j.apsusc.2026.166660

DO - 10.1016/j.apsusc.2026.166660

M3 - Article

SN - 0169-4332

SP - 166660

JO - Applied Surface Science

JF - Applied Surface Science

ER -