Highly substituted fullerene-based spin-on organic hardmasks

Alan G. Brown; Guy Dawson; Greg O'Callaghan; Carmen Popescu; Alexandra McClelland; Tom Lada; Bryan Schofield; Warren Montgomery; Alex P.G. Robinson

doi:10.1117/12.2552215

Highly substituted fullerene-based spin-on organic hardmasks

Alan G. Brown, Guy Dawson, Greg O'Callaghan, Carmen Popescu, Alexandra McClelland, Tom Lada, Bryan Schofield, Warren Montgomery, Alex P.G. Robinson^*

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Irresistible Materials has previously introduced the HM340 series of fullerene based spin-on carbon hardmasks, and reported on material characterization, including very high carbon content and high thermal stability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen level allows for high resolution etching without wiggling. In order to further increase semiconductor facilities (Fab) compatibility, thermal stability and etch resistance several new formulations are under development. Here we present the latest results for our new HM1360 series, avoiding the drain test issues encountered with higher concentration HM340 formulations, together with new and updated characterisation results for the more advanced formulations.

Original language	English
Title of host publication	Advances in Patterning Materials and Processes XXXVII
Editors	Roel Gronheid, Daniel P. Sanders
Publisher	SPIE
ISBN (Electronic)	9781510634190
DOIs	https://doi.org/10.1117/12.2552215
Publication status	Published - 2020
Event	Advances in Patterning Materials and Processes XXXVII 2020 - San Jose, United States Duration: 24 Feb 2020 → 26 Feb 2020

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	11326
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Advances in Patterning Materials and Processes XXXVII 2020
Country/Territory	United States
City	San Jose
Period	24/02/20 → 26/02/20

Bibliographical note

Publisher Copyright:
© 2020 SPIE.

Keywords

Fullerene
ICP Silicon Etching
Organic Hard Mask
Spin-on Carbon

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.2552215

Cite this

Brown, A. G., Dawson, G., O'Callaghan, G., Popescu, C., McClelland, A., Lada, T., Schofield, B., Montgomery, W., & Robinson, A. P. G. (2020). Highly substituted fullerene-based spin-on organic hardmasks. In R. Gronheid, & D. P. Sanders (Eds.), Advances in Patterning Materials and Processes XXXVII Article 1132618 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 11326). SPIE. https://doi.org/10.1117/12.2552215

@inproceedings{dd69d07c03ce4775a46282be8aea8936,

title = "Highly substituted fullerene-based spin-on organic hardmasks",

abstract = "Irresistible Materials has previously introduced the HM340 series of fullerene based spin-on carbon hardmasks, and reported on material characterization, including very high carbon content and high thermal stability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen level allows for high resolution etching without wiggling. In order to further increase semiconductor facilities (Fab) compatibility, thermal stability and etch resistance several new formulations are under development. Here we present the latest results for our new HM1360 series, avoiding the drain test issues encountered with higher concentration HM340 formulations, together with new and updated characterisation results for the more advanced formulations.",

keywords = "Fullerene, ICP Silicon Etching, Organic Hard Mask, Spin-on Carbon",

author = "Brown, \{Alan G.\} and Guy Dawson and Greg O'Callaghan and Carmen Popescu and Alexandra McClelland and Tom Lada and Bryan Schofield and Warren Montgomery and Robinson, \{Alex P.G.\}",

note = "Publisher Copyright: {\textcopyright} 2020 SPIE.; Advances in Patterning Materials and Processes XXXVII 2020 ; Conference date: 24-02-2020 Through 26-02-2020",

year = "2020",

doi = "10.1117/12.2552215",

language = "English",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Roel Gronheid and Sanders, \{Daniel P.\}",

booktitle = "Advances in Patterning Materials and Processes XXXVII",

}

Brown, AG, Dawson, G, O'Callaghan, G, Popescu, C, McClelland, A, Lada, T, Schofield, B, Montgomery, W & Robinson, APG 2020, Highly substituted fullerene-based spin-on organic hardmasks. in R Gronheid & DP Sanders (eds), Advances in Patterning Materials and Processes XXXVII., 1132618, Proceedings of SPIE - The International Society for Optical Engineering, vol. 11326, SPIE, Advances in Patterning Materials and Processes XXXVII 2020, San Jose, United States, 24/02/20. https://doi.org/10.1117/12.2552215

Highly substituted fullerene-based spin-on organic hardmasks. / Brown, Alan G.; Dawson, Guy; O'Callaghan, Greg et al.
Advances in Patterning Materials and Processes XXXVII. ed. / Roel Gronheid; Daniel P. Sanders. SPIE, 2020. 1132618 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 11326).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Highly substituted fullerene-based spin-on organic hardmasks

AU - Brown, Alan G.

AU - Dawson, Guy

AU - O'Callaghan, Greg

AU - Popescu, Carmen

AU - McClelland, Alexandra

AU - Lada, Tom

AU - Schofield, Bryan

AU - Montgomery, Warren

AU - Robinson, Alex P.G.

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N2 - Irresistible Materials has previously introduced the HM340 series of fullerene based spin-on carbon hardmasks, and reported on material characterization, including very high carbon content and high thermal stability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen level allows for high resolution etching without wiggling. In order to further increase semiconductor facilities (Fab) compatibility, thermal stability and etch resistance several new formulations are under development. Here we present the latest results for our new HM1360 series, avoiding the drain test issues encountered with higher concentration HM340 formulations, together with new and updated characterisation results for the more advanced formulations.

AB - Irresistible Materials has previously introduced the HM340 series of fullerene based spin-on carbon hardmasks, and reported on material characterization, including very high carbon content and high thermal stability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen level allows for high resolution etching without wiggling. In order to further increase semiconductor facilities (Fab) compatibility, thermal stability and etch resistance several new formulations are under development. Here we present the latest results for our new HM1360 series, avoiding the drain test issues encountered with higher concentration HM340 formulations, together with new and updated characterisation results for the more advanced formulations.

KW - Fullerene

KW - ICP Silicon Etching

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KW - Spin-on Carbon

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DO - 10.1117/12.2552215

M3 - Conference contribution

AN - SCOPUS:85085193790

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Advances in Patterning Materials and Processes XXXVII

A2 - Gronheid, Roel

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Y2 - 24 February 2020 through 26 February 2020

ER -

Highly substituted fullerene-based spin-on organic hardmasks

Abstract

Publication series

Conference

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

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