High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Original language	English
Article number	8328OU
Pages (from-to)	n/a
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8328
DOIs	https://doi.org/10.1117/12.916426
Publication status	Published - 2012

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@article{104399478d7c4506ab1ef946aac31c9c,

title = "High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask",

author = "Alexander Robinson",

year = "2012",

doi = "10.1117/12.916426",

language = "English",

volume = "8328",

pages = "n/a",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "Society of Photo-Optical Instrumentation Engineers",

}

TY - JOUR

T1 - High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

AU - Robinson, Alexander

PY - 2012

Y1 - 2012

U2 - 10.1117/12.916426

DO - 10.1117/12.916426

M3 - Article

SN - 0277-786X

VL - 8328

SP - n/a

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 8328OU

ER -