Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography

Paula Mendes, Susanne Jacke, K Critchley, Jose Plaza, Yu Chen, K Nikitin, Richard Palmer, Jon Preece, SD Evans, D Fitzmaurice

Research output: Contribution to journalArticle

184 Citations (Scopus)


This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.
Original languageEnglish
Pages (from-to)3766-3768
Number of pages3
Issue number9
Publication statusPublished - 27 Apr 2004


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