Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

Research output: Contribution to conference (unpublished) › Paper

Original language	English
Pages	219-224
Number of pages	6
Publication status	Published - 1 Jan 1999
Event	Materials Research Society Symposium Proceedings - Duration: 1 Jan 2006 → …

Conference	Materials Research Society Symposium Proceedings
Period	1/01/06 → …

Cite this

@conference{b4e6aeb7a6414a5082bdf3637cc43d42,

title = "Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography",

author = "Alexander Robinson and Richard Palmer and T Tada and T Kanayama and Elwyn Shelley and Jon Preece",

year = "1999",

month = jan,

day = "1",

language = "English",

pages = "219--224",

note = "Materials Research Society Symposium Proceedings ; Conference date: 01-01-2006",

}

TY - CONF

T1 - Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography

AU - Robinson, Alexander

AU - Palmer, Richard

AU - Tada, T

AU - Kanayama, T

AU - Shelley, Elwyn

AU - Preece, Jon

PY - 1999/1/1

Y1 - 1999/1/1

M3 - Paper

SP - 219

EP - 224

T2 - Materials Research Society Symposium Proceedings

Y2 - 1 January 2006

ER -