Fabrication of Step-and-Flash imprint lithography (S-FIL) templates using XeF2 enhanced focused Ion Beam Etching

J Kettle, RT Hoyle, Stefan Dimov

Research output: Contribution to journal › Article

5 Citations (Scopus)

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@article{7a37edff46314bc9b5306660a5bdddd9,

title = "Fabrication of Step-and-Flash imprint lithography (S-FIL) templates using XeF2 enhanced focused Ion Beam Etching",

author = "J Kettle and RT Hoyle and Stefan Dimov",

year = "2009",

month = jan,

day = "1",

language = "English",

volume = "96",

pages = "819--825",

journal = "Journal of Applied Physics",

issn = "1089-7550",

publisher = "American Institute of Physics",

number = "4",

}