Effects of current on early stages of focused ion beam nano-machining

Aydin Sabouri; Carl J Anthony; Philip D Prewett; James Bowen; Haider Butt

doi:10.1088/2053-1591/2/5/055005

Effects of current on early stages of focused ion beam nano-machining

Aydin Sabouri, Carl J Anthony, Philip D Prewett, James Bowen, Haider Butt

Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

In this report we investigate the effects of focused ion beam machining at low doses in the range of 10¹⁵–10¹⁶ ions cm⁻² for currents below 300 pA on Si(100) substrates. The effects of similar doses with currents in the range 10–300 pA were compared. The topography of resulting structures has been characterized using atomic force microscope, while crystallinity of the Si was assessed by means of Raman spectroscopy. These machining parameters allow a controllable preparation of structures either protruding from, or recessed into, the surface with nanometre precision.

Original language	English
Pages (from-to)	055005
Journal	Materials Research Express
Volume	2
Issue number	5
DOIs	https://doi.org/10.1088/2053-1591/2/5/055005
Publication status	Published - 11 May 2015

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http://stacks.iop.org/2053-1591/2/i=5/a=055005?key=crossref.2e1afaec47f2088da072f21e727ecbe7

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abstract = "In this report we investigate the effects of focused ion beam machining at low doses in the range of 1015–1016 ions cm−2 for currents below 300 pA on Si(100) substrates. The effects of similar doses with currents in the range 10–300 pA were compared. The topography of resulting structures has been characterized using atomic force microscope, while crystallinity of the Si was assessed by means of Raman spectroscopy. These machining parameters allow a controllable preparation of structures either protruding from, or recessed into, the surface with nanometre precision.",

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AU - Sabouri, Aydin

AU - Anthony, Carl J

AU - Prewett, Philip D

AU - Bowen, James

AU - Butt, Haider

PY - 2015/5/11

Y1 - 2015/5/11

N2 - In this report we investigate the effects of focused ion beam machining at low doses in the range of 1015–1016 ions cm−2 for currents below 300 pA on Si(100) substrates. The effects of similar doses with currents in the range 10–300 pA were compared. The topography of resulting structures has been characterized using atomic force microscope, while crystallinity of the Si was assessed by means of Raman spectroscopy. These machining parameters allow a controllable preparation of structures either protruding from, or recessed into, the surface with nanometre precision.

AB - In this report we investigate the effects of focused ion beam machining at low doses in the range of 1015–1016 ions cm−2 for currents below 300 pA on Si(100) substrates. The effects of similar doses with currents in the range 10–300 pA were compared. The topography of resulting structures has been characterized using atomic force microscope, while crystallinity of the Si was assessed by means of Raman spectroscopy. These machining parameters allow a controllable preparation of structures either protruding from, or recessed into, the surface with nanometre precision.

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DO - 10.1088/2053-1591/2/5/055005

M3 - Article

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SP - 055005

JO - Materials Research Express

JF - Materials Research Express

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ER -

Effects of current on early stages of focused ion beam nano-machining

Abstract

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