Effect of the substrate on the thermodynamic properties of PdHx films studied by hydrogenography

Y Pivak; R Gremaud; K Gross; M Gonzalez-Silveira; Allan Walton; David Book; H Schreuders; B Dam; R Griessen

doi:10.1016/j.scriptamat.2008.11.012

Effect of the substrate on the thermodynamic properties of PdHx films studied by hydrogenography

Y Pivak, R Gremaud, K Gross, M Gonzalez-Silveira, Allan Walton, David Book, H Schreuders, B Dam, R Griessen

Metallurgy and Materials

Research output: Contribution to journal › Article

42 Citations (Scopus)

Abstract

We investigated the influence of the substrate on the thermodynamic properties of metal hydride thin films by hydrogenography using PdHx as a model system. After appropriate hydrogen cycling, reproducible hydrogenation properties are found at the same equilibrium pressure for all substrates studied. Comparing these thin films with free-standing films-measured both by hydrogenography and by Sievert's method-we find a very similar behavior. Hence, thin films can be used to study the hydrogenation behavior of the corresponding bulk materials. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

Original language	English
Pages (from-to)	348-351
Number of pages	4
Journal	Scripta Materialia
Volume	60
Issue number	5
DOIs	https://doi.org/10.1016/j.scriptamat.2008.11.012
Publication status	Published - 1 Mar 2009

Keywords

Hydrogenography
Hysteresis
Clamping effect
Stress release
Free-standing film

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10.1016/j.scriptamat.2008.11.012

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title = "Effect of the substrate on the thermodynamic properties of PdHx films studied by hydrogenography",

abstract = "We investigated the influence of the substrate on the thermodynamic properties of metal hydride thin films by hydrogenography using PdHx as a model system. After appropriate hydrogen cycling, reproducible hydrogenation properties are found at the same equilibrium pressure for all substrates studied. Comparing these thin films with free-standing films-measured both by hydrogenography and by Sievert's method-we find a very similar behavior. Hence, thin films can be used to study the hydrogenation behavior of the corresponding bulk materials. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.",

keywords = "Hydrogenography, Hysteresis, Clamping effect, Stress release, Free-standing film",

author = "Y Pivak and R Gremaud and K Gross and M Gonzalez-Silveira and Allan Walton and David Book and H Schreuders and B Dam and R Griessen",

year = "2009",

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doi = "10.1016/j.scriptamat.2008.11.012",

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T1 - Effect of the substrate on the thermodynamic properties of PdHx films studied by hydrogenography

AU - Pivak, Y

AU - Gremaud, R

AU - Gross, K

AU - Gonzalez-Silveira, M

AU - Walton, Allan

AU - Book, David

AU - Schreuders, H

AU - Dam, B

AU - Griessen, R

PY - 2009/3/1

Y1 - 2009/3/1

N2 - We investigated the influence of the substrate on the thermodynamic properties of metal hydride thin films by hydrogenography using PdHx as a model system. After appropriate hydrogen cycling, reproducible hydrogenation properties are found at the same equilibrium pressure for all substrates studied. Comparing these thin films with free-standing films-measured both by hydrogenography and by Sievert's method-we find a very similar behavior. Hence, thin films can be used to study the hydrogenation behavior of the corresponding bulk materials. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

AB - We investigated the influence of the substrate on the thermodynamic properties of metal hydride thin films by hydrogenography using PdHx as a model system. After appropriate hydrogen cycling, reproducible hydrogenation properties are found at the same equilibrium pressure for all substrates studied. Comparing these thin films with free-standing films-measured both by hydrogenography and by Sievert's method-we find a very similar behavior. Hence, thin films can be used to study the hydrogenation behavior of the corresponding bulk materials. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

KW - Hydrogenography

KW - Hysteresis

KW - Clamping effect

KW - Stress release

KW - Free-standing film

U2 - 10.1016/j.scriptamat.2008.11.012

DO - 10.1016/j.scriptamat.2008.11.012

M3 - Article

SN - 1872-8456

VL - 60

SP - 348

EP - 351

JO - Scripta Materialia

JF - Scripta Materialia

IS - 5

ER -

Effect of the substrate on the thermodynamic properties of PdHx films studied by hydrogenography

Abstract

Keywords

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