Dynamic absorption coefficients of CAR and non-CAR resists at EUV

Roberto Fallica; Jason K. Stowers; Andrew Grenville; Andreas Frommhold; Alex P.G. Robinson; Yasin Ekinci

doi:10.1117/12.2219193

Dynamic absorption coefficients of CAR and non-CAR resists at EUV

Roberto Fallica, Jason K. Stowers, Andrew Grenville, Andreas Frommhold, Alex P.G. Robinson, Yasin Ekinci

Chemical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The dynamic absorption coefficients of several CAR and non-CAR EUV photoresists are measured experimentally using a specifically developed setup in transmission mode at the XIL beamline of the Swiss Light Source. The absorption coefficient α and the Dill parameters ABC were measured with unprecedented accuracy. In general the α of resists match very closely with the theoretical value calculated from elemental densities and absorption coefficients, whereas exceptions are observed. In addition, through the direct measurements of the absorption coefficients and dose-to-clear values, we introduce a new figure of merit called Chemical Sensitivity to account for all the post-absorption chemical reaction ongoing in the resist, which is also predicts a quantitative clearing volume, and respectively clearing radius, due to the photon absorption in the resist. These parameters may help in deeper insight into the underlying mechanisms of EUV concept of clearing volume and clearing radius are then defined and quantitatively calculated.

Original language	English
Title of host publication	Extreme Ultraviolet (EUV) Lithography VII
Editors	Eric M. Panning, Kenneth A. Goldberg
Publisher	SPIE
ISBN (Electronic)	9781510600119
DOIs	https://doi.org/10.1117/12.2219193
Publication status	Published - 2016
Event	Extreme Ultraviolet (EUV) Lithography VII - San Jose, United States Duration: 22 Feb 2016 → 25 Feb 2016

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	9776
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Extreme Ultraviolet (EUV) Lithography VII
Country/Territory	United States
City	San Jose
Period	22/02/16 → 25/02/16

Bibliographical note

Publisher Copyright:
© 2016 SPIE.

Keywords

Absorption coefficient
alpha
Chemical Sensitivity
clearing radius
Clearing volume
CS
Dill parameters

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.2219193

Cite this

Fallica, R., Stowers, J. K., Grenville, A., Frommhold, A., Robinson, A. P. G., & Ekinci, Y. (2016). Dynamic absorption coefficients of CAR and non-CAR resists at EUV. In E. M. Panning, & K. A. Goldberg (Eds.), Extreme Ultraviolet (EUV) Lithography VII Article 977612 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9776). SPIE. https://doi.org/10.1117/12.2219193

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title = "Dynamic absorption coefficients of CAR and non-CAR resists at EUV",

abstract = "The dynamic absorption coefficients of several CAR and non-CAR EUV photoresists are measured experimentally using a specifically developed setup in transmission mode at the XIL beamline of the Swiss Light Source. The absorption coefficient α and the Dill parameters ABC were measured with unprecedented accuracy. In general the α of resists match very closely with the theoretical value calculated from elemental densities and absorption coefficients, whereas exceptions are observed. In addition, through the direct measurements of the absorption coefficients and dose-to-clear values, we introduce a new figure of merit called Chemical Sensitivity to account for all the post-absorption chemical reaction ongoing in the resist, which is also predicts a quantitative clearing volume, and respectively clearing radius, due to the photon absorption in the resist. These parameters may help in deeper insight into the underlying mechanisms of EUV concept of clearing volume and clearing radius are then defined and quantitatively calculated.",

keywords = "Absorption coefficient, alpha, Chemical Sensitivity, clearing radius, Clearing volume, CS, Dill parameters",

author = "Roberto Fallica and Stowers, {Jason K.} and Andrew Grenville and Andreas Frommhold and Robinson, {Alex P.G.} and Yasin Ekinci",

note = "Publisher Copyright: {\textcopyright} 2016 SPIE.; Extreme Ultraviolet (EUV) Lithography VII ; Conference date: 22-02-2016 Through 25-02-2016",

year = "2016",

doi = "10.1117/12.2219193",

language = "English",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

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Fallica, R, Stowers, JK, Grenville, A, Frommhold, A, Robinson, APG & Ekinci, Y 2016, Dynamic absorption coefficients of CAR and non-CAR resists at EUV. in EM Panning & KA Goldberg (eds), Extreme Ultraviolet (EUV) Lithography VII., 977612, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9776, SPIE, Extreme Ultraviolet (EUV) Lithography VII, San Jose, United States, 22/02/16. https://doi.org/10.1117/12.2219193

Dynamic absorption coefficients of CAR and non-CAR resists at EUV. / Fallica, Roberto; Stowers, Jason K.; Grenville, Andrew et al.
Extreme Ultraviolet (EUV) Lithography VII. ed. / Eric M. Panning; Kenneth A. Goldberg. SPIE, 2016. 977612 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9776).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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AU - Fallica, Roberto

AU - Stowers, Jason K.

AU - Grenville, Andrew

AU - Frommhold, Andreas

AU - Robinson, Alex P.G.

AU - Ekinci, Yasin

PY - 2016

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N2 - The dynamic absorption coefficients of several CAR and non-CAR EUV photoresists are measured experimentally using a specifically developed setup in transmission mode at the XIL beamline of the Swiss Light Source. The absorption coefficient α and the Dill parameters ABC were measured with unprecedented accuracy. In general the α of resists match very closely with the theoretical value calculated from elemental densities and absorption coefficients, whereas exceptions are observed. In addition, through the direct measurements of the absorption coefficients and dose-to-clear values, we introduce a new figure of merit called Chemical Sensitivity to account for all the post-absorption chemical reaction ongoing in the resist, which is also predicts a quantitative clearing volume, and respectively clearing radius, due to the photon absorption in the resist. These parameters may help in deeper insight into the underlying mechanisms of EUV concept of clearing volume and clearing radius are then defined and quantitatively calculated.

AB - The dynamic absorption coefficients of several CAR and non-CAR EUV photoresists are measured experimentally using a specifically developed setup in transmission mode at the XIL beamline of the Swiss Light Source. The absorption coefficient α and the Dill parameters ABC were measured with unprecedented accuracy. In general the α of resists match very closely with the theoretical value calculated from elemental densities and absorption coefficients, whereas exceptions are observed. In addition, through the direct measurements of the absorption coefficients and dose-to-clear values, we introduce a new figure of merit called Chemical Sensitivity to account for all the post-absorption chemical reaction ongoing in the resist, which is also predicts a quantitative clearing volume, and respectively clearing radius, due to the photon absorption in the resist. These parameters may help in deeper insight into the underlying mechanisms of EUV concept of clearing volume and clearing radius are then defined and quantitatively calculated.

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Dynamic absorption coefficients of CAR and non-CAR resists at EUV

Abstract

Publication series

Conference

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

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Cite this