Abstract
Dissociative electron attachment to the highly reactive difluoromethylene molecule, CF2, produced in a C3F6/He microwave plasma and stepwise via the fast atom reaction CF3I + H --> CF3 + HI and CF3 + H --> CF2 + HF, has been investigated. The upper limit for the cross section of formation of F- via dissociative electron attachment to CF2 is estimated to be 5 x 10(-4) angstrom(2). This value is four orders of magnitude smaller than the cross section previously predicted from scattering calculations. It is concluded that difluoromethylene plays a negligible role in negative ion formation in fluorocarbon plasmas.
Original language | English |
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Pages (from-to) | 083035 |
Number of pages | 1 |
Journal | New Journal of Physics |
Volume | 12 |
DOIs | |
Publication status | Published - 1 Aug 2010 |