Colloidal lines and strings

Ge Su; Quanmin Guo; Richard Palmer

Colloidal lines and strings

Ge Su
, Quanmin Guo
, Richard Palmer

Research output: Contribution to journal › Article

34 Citations (Scopus)

Abstract

Self-assembly of polystyrene spheres guided by pattered InP substrates has been studied using atomic force microscopy (AFM). Using photoresist stripes and posts, 1-D and 2-D colloidal particle structures were found to preferentially nucleate at the step edges of the photoresist. The dangling bonds created by photocleavage of molecular bonds at the steps are identified as playing a major role in attracting the colloidal suspension.

Original language	English
Pages (from-to)	9669-9671
Number of pages	3
Journal	Langmuir
Volume	19
Publication status	Published - 1 Jan 2003

Cite this

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title = "Colloidal lines and strings",

abstract = "Self-assembly of polystyrene spheres guided by pattered InP substrates has been studied using atomic force microscopy (AFM). Using photoresist stripes and posts, 1-D and 2-D colloidal particle structures were found to preferentially nucleate at the step edges of the photoresist. The dangling bonds created by photocleavage of molecular bonds at the steps are identified as playing a major role in attracting the colloidal suspension.",

author = "Ge Su and Quanmin Guo and Richard Palmer",

year = "2003",

month = jan,

day = "1",

language = "English",

volume = "19",

pages = "9669--9671",

journal = "Langmuir",

publisher = "American Chemical Society",

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T1 - Colloidal lines and strings

AU - Su, Ge

AU - Guo, Quanmin

AU - Palmer, Richard

PY - 2003/1/1

Y1 - 2003/1/1

N2 - Self-assembly of polystyrene spheres guided by pattered InP substrates has been studied using atomic force microscopy (AFM). Using photoresist stripes and posts, 1-D and 2-D colloidal particle structures were found to preferentially nucleate at the step edges of the photoresist. The dangling bonds created by photocleavage of molecular bonds at the steps are identified as playing a major role in attracting the colloidal suspension.

AB - Self-assembly of polystyrene spheres guided by pattered InP substrates has been studied using atomic force microscopy (AFM). Using photoresist stripes and posts, 1-D and 2-D colloidal particle structures were found to preferentially nucleate at the step edges of the photoresist. The dangling bonds created by photocleavage of molecular bonds at the steps are identified as playing a major role in attracting the colloidal suspension.

M3 - Article

VL - 19

SP - 9669

EP - 9671

JO - Langmuir

JF - Langmuir

ER -

Colloidal lines and strings

Abstract

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