Original language | Undefined/Unknown |
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Journal | Microelectronic Engineering |
DOIs | |
Publication status | Published - 2006 |
Chemically amplified molecular resists for electron beam lithography
A.P.G. Robinson, H.M. Zaid, F.P. Gibbons, R.E. Palmer, M. Manickam, J.A. Preece, R. Brainard, T. Zampini, K. O'Connell
Research output: Contribution to journal › Article › peer-review
32
Citations
(Scopus)