Chemically amplified molecular resists for electron beam lithography

A.P.G. Robinson; H.M. Zaid; F.P. Gibbons; R.E. Palmer; M. Manickam; J.A. Preece; R. Brainard; T. Zampini; K. O'Connell

doi:10.1016/j.mee.2006.01.151

Chemically amplified molecular resists for electron beam lithography

A.P.G. Robinson, H.M. Zaid, F.P. Gibbons, R.E. Palmer, M. Manickam, J.A. Preece, R. Brainard, T. Zampini, K. O'Connell

Research output: Contribution to journal › Article › peer-review

32 Citations (Scopus)

Original language	Undefined/Unknown
Journal	Microelectronic Engineering
DOIs	https://doi.org/10.1016/j.mee.2006.01.151
Publication status	Published - 2006

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10.1016/j.mee.2006.01.151

Cite this

@article{2892eaf896024625bb1b538fe131904a,

title = "Chemically amplified molecular resists for electron beam lithography",

author = "A.P.G. Robinson and H.M. Zaid and F.P. Gibbons and R.E. Palmer and M. Manickam and J.A. Preece and R. Brainard and T. Zampini and K. O'Connell",

year = "2006",

doi = "10.1016/j.mee.2006.01.151",

language = "Undefined/Unknown",

journal = "Microelectron Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Chemically amplified molecular resists for electron beam lithography

AU - Robinson, A.P.G.

AU - Zaid, H.M.

AU - Gibbons, F.P.

AU - Palmer, R.E.

AU - Manickam, M.

AU - Preece, J.A.

AU - Brainard, R.

AU - Zampini, T.

AU - O'Connell, K.

PY - 2006

Y1 - 2006

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-33748280238&partnerID=MN8TOARS

U2 - 10.1016/j.mee.2006.01.151

DO - 10.1016/j.mee.2006.01.151

M3 - Article

JO - Microelectron Engineering

JF - Microelectron Engineering

SN - 0167-9317

ER -