Chemically amplified molecular resists for electron beam lithography

Alexander Robinson; HM Zaid; FP Gibbons; Richard Palmer; Mayandithevar Manickam; Jon Preece; R Brainard; T Zampini; K O'Connell

doi:10.1016/j.mee.2006.01.151

Chemically amplified molecular resists for electron beam lithography

Alexander Robinson, HM Zaid, FP Gibbons, Richard Palmer, Mayandithevar Manickam, Jon Preece, R Brainard, T Zampini, K O'Connell

Research output: Contribution to conference (unpublished) › Paper

32 Citations (Scopus)

Original language	English
Pages	1115-1118
Number of pages	4
DOIs	https://doi.org/10.1016/j.mee.2006.01.151
Publication status	Published - 1 Apr 2006
Event	31st International Conference on Micro- and Nano-Engineering, Sep 19-22, 2005. Vienna, Austria - Duration: 1 Apr 2006 → …

Conference

Conference	31st International Conference on Micro- and Nano-Engineering, Sep 19-22, 2005. Vienna, Austria
Period	1/04/06 → …

Keywords

fullerene
molecular resist
electron beam lithography
triphenylene

Access to Document

10.1016/j.mee.2006.01.151

Cite this

@conference{f9d47c2c31fa4a5bb4faf0ca3c2b0915,

title = "Chemically amplified molecular resists for electron beam lithography",

keywords = "fullerene, molecular resist, electron beam lithography, triphenylene",

author = "Alexander Robinson and HM Zaid and FP Gibbons and Richard Palmer and Mayandithevar Manickam and Jon Preece and R Brainard and T Zampini and K O'Connell",

year = "2006",

month = apr,

day = "1",

doi = "10.1016/j.mee.2006.01.151",

language = "English",

pages = "1115--1118",

note = "31st International Conference on Micro- and Nano-Engineering, Sep 19-22, 2005. Vienna, Austria ; Conference date: 01-04-2006",

}

TY - CONF

T1 - Chemically amplified molecular resists for electron beam lithography

AU - Robinson, Alexander

AU - Zaid, HM

AU - Gibbons, FP

AU - Palmer, Richard

AU - Manickam, Mayandithevar

AU - Preece, Jon

AU - Brainard, R

AU - Zampini, T

AU - O'Connell, K

PY - 2006/4/1

Y1 - 2006/4/1

KW - fullerene

KW - molecular resist

KW - electron beam lithography

KW - triphenylene

U2 - 10.1016/j.mee.2006.01.151

DO - 10.1016/j.mee.2006.01.151

M3 - Paper

SP - 1115

EP - 1118

T2 - 31st International Conference on Micro- and Nano-Engineering, Sep 19-22, 2005. Vienna, Austria

Y2 - 1 April 2006

ER -