Chemically amplified molecular resists for e-beam lithography

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Original language	English
Journal	Microelectronic Engineering
DOIs	https://doi.org/10.1016/j.mee.2007.12.001
Publication status	Published - 2008

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@article{f7f8f91fe2924f8d8aeec4edb8ce4fb3,

title = "Chemically amplified molecular resists for e-beam lithography",

author = "F.P. Gibbons and J. Manyam and S. Diegoli and M. Manickam and J.A. Preece and R.E. Palmer and A.P.G. Robinson",

year = "2008",

doi = "10.1016/j.mee.2007.12.001",

language = "English",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Chemically amplified molecular resists for e-beam lithography

AU - Gibbons, F.P.

AU - Manyam, J.

AU - Diegoli, S.

AU - Manickam, M.

AU - Preece, J.A.

AU - Palmer, R.E.

AU - Robinson, A.P.G.

PY - 2008

Y1 - 2008

UR - https://www.scopus.com/pages/publications/44149113331

U2 - 10.1016/j.mee.2007.12.001

DO - 10.1016/j.mee.2007.12.001

M3 - Article

SN - 0167-9317

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -