Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching

Andreas Frommhold^*, Dongxu Yang, Jedsada Manyam, Mayandithevar Manickam, Edward Tarte, Jon Preece, Richard Palmer, Alex P G Robinson, Edward Tarte

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

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Finished
EPSRC/FSE Collaboration ref APGR/EPSRC-10-1 - Next Generation Resist Technology for the Semiconductor Industry
Robinson, A.
Engineering & Physical Science Research Council
8/04/11 → 7/07/12
Project: Research Councils