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Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching
Andreas Frommhold*, Dongxu Yang, Jedsada Manyam, Mayandithevar Manickam, Edward Tarte, Jon Preece, Richard Palmer, Alex P G Robinson, Edward Tarte
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
5
Citations
(Scopus)