Chemically amplified fullerene resists for e-beam lithography

J. Manyam, F.P. Gibbons, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

11 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
DOIs	https://doi.org/10.1117/12.772645
Publication status	Published - 2008

Access to Document

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title = "Chemically amplified fullerene resists for e-beam lithography",

author = "J. Manyam and F.P. Gibbons and S. Diegoli and M. Manickam and J.A. Preece and R.E. Palmer and A.P.G. Robinson",

year = "2008",

doi = "10.1117/12.772645",

language = "Undefined/Unknown",

isbn = "0277786X",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

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TY - GEN

T1 - Chemically amplified fullerene resists for e-beam lithography

AU - Manyam, J.

AU - Gibbons, F.P.

AU - Diegoli, S.

AU - Manickam, M.

AU - Preece, J.A.

AU - Palmer, R.E.

AU - Robinson, A.P.G.

PY - 2008

Y1 - 2008

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U2 - 10.1117/12.772645

DO - 10.1117/12.772645

M3 - Conference contribution

SN - 0277786X

BT - Proceedings of SPIE - The International Society for Optical Engineering

ER -