Chemically amplified fullerene resists for e-beam lithography

J. Manyam, F.P. Gibbons, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

11 Citations (Scopus)
Original languageUndefined/Unknown
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Publication statusPublished - 2008

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